SCHEMBL23907146

SCHEMBL23907146

CC(Oc1ccc(Cc2ccc(OC(C)OC3CCCCC3)cc2)cc1)OC1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.41
ALDH1A1 P00352 2/20 0.39
KDM4E B2RXH2 1/20 0.39
GRM2 Q14416 4/20 0.37
HRH3 Q9Y5N1 3/20 0.36
HTT P42858 1/20 0.36
HRH4 Q9H3N8 1/20 0.36
HRH1 P35367 1/20 0.36
NPC1 O15118 1/20 0.35
HPGD P15428 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ALOX12 P18054 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907079 0.93 LTA4H (0.40) LTA4HALDH1A1KDM4ENPC1HPGD
SCHEMBL7108437 0.89 ALDH1A1 (0.38) ALDH1A1KDM4EGRM2HRH3NPC1
SCHEMBL14086001 0.88 ACACB (0.38) ALDH1A1KDM4EGRM2HRH3HTT
SCHEMBL7102645 0.86 KMT2A (0.42) ALDH1A1KDM4EHTTHPGD
SCHEMBL26015195 0.85 ALDH1A1 (0.36) ALDH1A1KDM4EGRM2HRH3ALOX12
SCHEMBL14838227 0.85 HTT (0.44) ALDH1A1KDM4EGRM2HRH3HTT
SCHEMBL23907136 0.85 KDM4E (0.39) ALDH1A1KDM4EGRM2NPC1HPGD
SCHEMBL13717178 0.84 ESR1 (0.42) LTA4H
SCHEMBL7106732 0.84 ALDH1A1 (0.37) ALDH1A1KDM4EGRM2HRH3HTT
SCHEMBL15984209 0.83 MEN1 (0.41) ALDH1A1KDM4EHRH3NPC1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed