SCHEMBL23907142

SCHEMBL23907142

CC(Oc1ccc(Sc2ccc(O)cc2)cc1)OC1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.39
SMN1; SMN2 Q16637 5/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 2/20 0.35
HPGD P15428 2/20 0.35
MAPT P10636 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
CHRM2 P08172 1/20 0.34
CHRM1 P11229 1/20 0.34
NPSR1 Q6W5P4 3/20 0.33
ALDH1A1 P00352 2/20 0.33
KDM4E B2RXH2 1/20 0.33
PTGIR P43119 1/20 0.32
MITF O75030 1/20 0.31
ALOX15 P16050 1/20 0.30
MAPK1 P28482 1/20 0.30
MAPK10 P53779 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907145 0.93 SMN1; SMN2 (0.36) SMN1; SMN2MEN1KMT2ALMNAHPGD
SCHEMBL11125523 0.90 KDM4E (0.38) SMN1; SMN2MEN1KMT2AHPGDNPC1
SCHEMBL23907140 0.87 MEN1 (0.42) NR1H2SMN1; SMN2MEN1KMT2AHPGD
SCHEMBL23907079 0.83 LTA4H (0.40) SMN1; SMN2MEN1KMT2AHPGDNPC1
SCHEMBL23907073 0.82 HPGD (0.43) SMN1; SMN2MEN1KMT2ALMNAHPGD
SCHEMBL13154068 0.81 KDM4E (0.35) SMN1; SMN2MEN1KMT2AHPGDNPC1
SCHEMBL3843023 0.81 APP (0.41) SMN1; SMN2MEN1KMT2AHPGDMAPT
SCHEMBL23907136 0.79 KDM4E (0.39) SMN1; SMN2MEN1KMT2ALMNAHPGD
SCHEMBL15984209 0.77 MEN1 (0.41) SMN1; SMN2MEN1KMT2AHPGDMAPT
SCHEMBL6761927 0.76 KMT2A (0.37) SMN1; SMN2MEN1KMT2AHPGDNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed