SCHEMBL7108437

SCHEMBL7108437

CCc1ccc(OC(C)OC2CCCCC2)cc1

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
KDM4E B2RXH2 1/20 0.38
ALOX12 P18054 1/20 0.37
GRM2 Q14416 4/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
SLC6A3 Q01959 1/20 0.36
PPARG P37231 1/20 0.36
PPARA Q07869 1/20 0.36
HRH3 Q9Y5N1 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907146 0.89 LTA4H (0.41) ALDH1A1KDM4EALOX12GRM2HRH3
SCHEMBL7102645 0.88 KMT2A (0.42) ALDH1A1KDM4EPPARGPPARA
SCHEMBL14086001 0.86 ACACB (0.38) ALDH1A1KDM4EGRM2HRH3NPC1
SCHEMBL7106732 0.85 ALDH1A1 (0.37) ALDH1A1KDM4EALOX12GRM2PPARG
SCHEMBL26015195 0.84 ALDH1A1 (0.36) ALDH1A1KDM4EALOX12GRM2HRH3
SCHEMBL14838227 0.84 HTT (0.44) ALDH1A1KDM4EGRM2HRH3
SCHEMBL23907136 0.83 KDM4E (0.39) ALDH1A1KDM4EALOX12GRM2NPC1
SCHEMBL23907079 0.82 LTA4H (0.40) ALDH1A1KDM4EALOX12NPC1RAB9A
SCHEMBL15984209 0.82 MEN1 (0.41) ALDH1A1KDM4EHRH3NPC1RAB9A
SCHEMBL825446 0.82 ALDH1A1 (0.43) ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11747727-B2 Chemical liquid, chemical liquid storage body, pattern forming method, and kit FUJIFILM CORPORATION (JP) 2023-09-05 US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 US disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed