SCHEMBL23911908

SCHEMBL23911908

CCCC(C)CNC(=O)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.54
NPC1 O15118 3/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
NAAA Q02083 1/20 0.53
GAA P10253 2/20 0.52
KMT2A Q03164 1/20 0.51
HSD17B10 Q99714 1/20 0.51
EPHX2 P34913 1/20 0.50
GPR139 Q6DWJ6 1/20 0.48
LMNA P02545 1/20 0.47
POLB P06746 1/20 0.47
PRSS1 P07477 1/20 0.47
CTSG P08311 1/20 0.47
CTRB1 P17538 1/20 0.47
CMA1 P23946 1/20 0.47
HPGD P15428 3/20 0.46
ALDH1A1 P00352 2/20 0.46
NAMPT P43490 2/20 0.46
NPSR1 Q6W5P4 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL799425 0.86 NAMPT (0.58) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL19349021 0.86 NAMPT (0.58) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL6579629 0.84 NAAA (0.58) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL23106466 0.84 LMNA (0.50) RAB9ANPC1GAAKMT2AEPHX2
SCHEMBL10912509 0.83 NPC1 (0.57) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL19112997 0.82 KMT2A (0.55) SMN1; SMN2GAAKMT2AHSD17B10GPR139
SCHEMBL16613793 0.82 RAB9A (0.53) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL28181763 0.82 NPC1 (0.53) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL12471405 0.82 NPC1 (0.53) RAB9ANPC1SMN1; SMN2NAAAGAA
SCHEMBL1707501 0.81 RAB9A (0.63) RAB9ANPC1SMN1; SMN2NAAAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3757677-B1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2021-10-13 EP disclosed