Biphenyl

Biphenyl

SCHEMBL23923632

O=C=NCCN=C=O.OCCO.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
GAA P10253 2/20 0.36
LMNA P02545 2/20 0.36
ABCC4 O15439 1/20 0.36
TSHR P16473 1/20 0.36
PTGS1 P23219 1/20 0.36
HTT P42858 1/20 0.36
MMP2 P08253 1/20 0.36
MMP9 P14780 1/20 0.36
MMP12 P39900 1/20 0.36
MMP13 P45452 1/20 0.36
MMP14 P50281 1/20 0.36
MMP3 P08254 1/20 0.34
BCL2L1 Q07817 1/20 0.34
RECQL P46063 1/20 0.34
SMN1; SMN2 Q16637 4/20 0.34
FFAR1 O14842 3/20 0.34
MAPT P10636 2/20 0.34
PTPN1 P18031 1/20 0.34
GSK3B P49841 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL2448212 0.91 ALDH1A1 (0.45) ALDH1A1GAALMNAABCC4TSHR
Biphenyl SCHEMBL3023954 0.88 ALDH1A1 (0.36) ALDH1A1GAALMNASMN1; SMN2MAPT
Phenol SCHEMBL11151921 0.86 TDP1 (0.44) ALDH1A1GAALMNAMMP3BCL2L1
Toluene SCHEMBL3469198 0.84 LMNA (0.42) GAALMNATSHRSMN1; SMN2MAPT
Diphenylmethane SCHEMBL3468615 0.84 CALM1 (0.46) ALDH1A1LMNATSHRBCL2L1PTPN1
Biphenyl SCHEMBL3012620 0.82 NAAA (0.38) ALDH1A1GAASMN1; SMN2MAPTL3MBTL1
Biphenyl SCHEMBL2353895 0.81 NAAA (0.44) ALDH1A1GAALMNAABCC4TSHR
SCHEMBL11031759 0.79 CYP3A4 (0.32) ALDH1A1TSHRTDP1
Ethylene Glycol SCHEMBL620461 0.79 TSHR (0.33) TSHR
Biphenyl SCHEMBL15542 0.78 ALDH1A1 (0.45) ALDH1A1GAALMNAABCC4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11667061-B2 Method of forming leveraged poromeric polishing pad ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-06-06 US disclosed
US-20210323116-A1 OFFSET PORE POROMERIC POLISHING PAD U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-10-21 US disclosed
US-20210323115-A1 LEVERAGED POROMERIC POLISHING PAD DuPont Electronic Materials Holding, Inc. 2021-10-21 US disclosed
US-20210323202-A1 METHOD OF FORMING LEVERAGED POROMERIC POLISHING PAD U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-10-21 US disclosed