Ethylene

Ethylene

SCHEMBL23930710

C=C.C=C.C=C.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Ethylene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL28531291 1.00
Ethylene SCHEMBL29093579 1.00
Ethylene SCHEMBL1274207 1.00
Ethylene SCHEMBL27265937 1.00
Ethylene SCHEMBL28523652 1.00
Ethylene SCHEMBL14244985 1.00
Ethylene SCHEMBL2473293 0.87
Ethylene SCHEMBL7616403 0.87
Ethylene SCHEMBL3490693 0.87
Ethylene SCHEMBL2224283 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230167220-A1 HIGHLY ELECTRICAL CONDUCTIVE COMPOSITE MATERIAL BASED ON GRAPHENE-LITHIUM POLYCARBOXYLATE-NANOPARTICLES UNIVERSIDAD DE CHILE (CL) 2023-06-01 US disclosed
WO-2021214524-A1 HIGHLY ELECTRICAL CONDUCTIVE COMPOSITE MATERIAL BASED ON GRAPHENE-LITHIUM POLYCARBOXYLATE-NANOPARTICLES UNIVERSIDAD DE CHILE (CL) 2021-10-28 WO disclosed
CN-109071258-A Inorganic oxide fine particles having amphiphilic organosilane compound bonded thereto, organic solvent dispersion liquid thereof, and composition for forming coating film 日产化学工业株式会社 2018-12-21 CN disclosed
CN-104546544-B Nail enamel composition 施乐公司 2017-10-03 CN disclosed
CN-104546544-A NAIL POLISH COMPOSITIONS XEROX CORP 2015-04-29 CN disclosed
CN-103076718-B Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board ASAHI KASEI E MATERIALS CORP 2015-01-21 CN disclosed
CN-104111585-A Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern ASAHI KASEI E MATERIALS CORP 2014-10-22 CN disclosed
CN-101978321-B Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, printed wiring board, lead frame, semiconductor package, and method for producing uneven substrate ASAHI KASEI E MATERIALS CORP 2013-06-12 CN disclosed
CN-103076718-A Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board ASAHI KASEI E MATERIALS CORP 2013-05-01 CN disclosed
CN-101432661-B Photosensitive resin laminate ASAHI KASEI E MATERIALS CORP 2012-09-05 CN disclosed
CN-101290471-B Photoresist combination and laminating body ASAHI KASEI EMD CORP 2011-07-06 CN disclosed
CN-101978321-A Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, printed wiring board, lead frame, semiconductor package, and method for producing uneven substrate ASAHI KASEI E MATERIALS CORP 2011-02-16 CN disclosed
CN-101484521-A Novel biodegradable polymer composition useful for the preparation of biodegradable plastic and a process for the preparation of said composition BNT FORCE BIODEGRADABLE POLYME (IN) 2009-07-15 CN disclosed
CN-101438208-A Photosensitive resin composition ASAHI KASEI EMD CORP (JP) 2009-05-20 CN disclosed
CN-101432661-A Photosensitive resin laminate ASAHI KASEI EMD CORP (JP) 2009-05-13 CN disclosed
CN-101290471-A Photoresist combination and laminating body ASAHI KASEI EMD CORP (JP) 2008-10-22 CN disclosed
CN-1128611-C Emulsified, water-in-oil type composition and skin cosmetic preparation KAO CORP (JP) 2003-11-26 CN disclosed
CN-1233282-A Laundry detergent compositions comprising beta-ketoester pro-fragrances PROCTER & GAMBLE (US) 1999-10-27 CN disclosed
CN-1233281-A Hand-wash laundry detergent compositions comprising beta-ketoester pro-fragrances PROCTER & GAMBLE (US) 1999-10-27 CN disclosed
CN-1150539-A Emulsified, water-in-oil type composition and skin cosmetic preparation KAO CORP (JP) 1997-05-28 CN disclosed