SCHEMBL2406103

SCHEMBL2406103

CCC1(C=C(C)C(=O)O)C2CC3CC(C2)CC1(O)C3

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.34
THRB P10828 1/20 0.30
CYP2C9 P11712 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5935903 0.89 HSD11B1 (0.33) HSD11B1
SCHEMBL2406896 0.77 HSD11B1 (0.33) HSD11B1THRBCYP2C9
SCHEMBL5935935 0.73 HSD11B1 (0.32) HSD11B1THRBCYP2C9
SCHEMBL1397128 0.73 HSD11B1 (0.34) HSD11B1
SCHEMBL564565 0.73 HSD11B1 (0.34) HSD11B1
SCHEMBL701760 0.72 HSD11B1 (0.33) HSD11B1
SCHEMBL703226 0.71
SCHEMBL8595506 0.70 THRB (0.34) THRBCYP2C9
SCHEMBL757168 0.70 THRB (0.39) HSD11B1THRBCYP2C9
SCHEMBL157720 0.70 THRB (0.39) HSD11B1THRBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9594303-B2 Resist pattern-forming method and photoresist composition JSR CORPORATION (JP) 2017-03-14 US disclosed
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-20150010866-A1 RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-01-08 US disclosed
US-8758978-B2 Radiation-sensitive resin composition, resist pattern formation method, and polymer JSR CORPORATION (JP) 2014-06-24 US disclosed
US-8535871-B2 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer JSR CORPORATION (JP) 2013-09-17 US disclosed
US-20120183902-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed
US-20120171612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER JSR CORPORATION (JP) 2012-07-05 US disclosed
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER JSR CORPORATION (JP) 2012-06-21 US disclosed
US-20110212401-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2011-09-01 US disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER RER1, PRMT1, REV1 HSD11B1 3550/4885THRB 3597/4885CYP2C9 3574/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.