Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | CA4 | P22748 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 5/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11023300 | 0.85 | BBOX1 (0.37) | ALDH1A1CA4TSHRTDP1ALOX12 | |
| SCHEMBL3488774 | 0.79 | TSHR (0.35) | ALDH1A1CA4TSHRALOX12LMNA | |
| SCHEMBL1030483 | 0.77 | ALDH1A1 (0.39) | ALDH1A1CA4TSHRTDP1ALOX12 | |
| SCHEMBL376165 | 0.75 | ALDH1A1 (0.40) | ALDH1A1CA4TSHRTDP1ALOX12 | |
| SCHEMBL15880078 | 0.72 | TSHR (0.35) | ALDH1A1CA4TSHRALOX12LMNA | |
| Hydrochloric Acid SCHEMBL28350123 | 0.72 | ALDH1A1 (0.38) | ALDH1A1CA4TSHRTDP1ALOX12 | |
| Water SCHEMBL8463966 | 0.72 | ALDH1A1 (0.38) | ALDH1A1CA4TSHRTDP1ALOX12 | |
| SCHEMBL2324884 | 0.70 | CA4 (0.41) | ALDH1A1CA4TSHRALOX12CA1 | |
| SCHEMBL2322242 | 0.70 | CA4 (0.41) | ALDH1A1CA4TSHRALOX12CA1 | |
| SCHEMBL1031719 | 0.69 | ALDH1A1 (0.35) | ALDH1A1CA4TSHRTDP1ALOX12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2346815-B1 | METHOD FOR PRODUCING COMPOUNDS INCLUDING NITRILE FUNCTIONS | INVISTA Technologies S à r l (CH) | 2016-04-20 | — | — | EP | claimed |
| US-9174207-B2 | Process for producing compounds comprising nitrile functions | INVISTA NORTH AMERICA S.A.R.L. (US) | 2015-11-03 | — | — | US | claimed |
| US-20120004440-A1 | PROCESS FOR PRODUCING COMPOUNDS COMPRISING NITRILE FUNCTIONS | INVISTA NORTH AMERICA SARL | 2012-01-05 | — | — | US | claimed |
| EP-2382186-A1 | METHOD FOR PRODUCING COMPOUNDS INCLUDING NITRILE FUNCTIONS | Rhodia Opérations (FR) | 2011-11-02 | — | — | EP | claimed |
| WO-2010086246-A1 | METHOD FOR PRODUCING COMPOUNDS INCLUDING NITRILE FUNCTIONS | RHODIA OPERATIONS (FR) | 2010-08-05 | — | — | WO | claimed |
| WO-2010046226-A1 | METHOD FOR PRODUCING COMPOUNDS INCLUDING NITRILE FUNCTIONS | RHODIA OPERATIONS (FR) | 2010-04-29 | — | — | WO | claimed |
| EP-0043480-B1 | PROCESS FOR FORMING METALLIC IMAGES | Hitachi, Ltd. (JP) | 1985-04-03 | — | — | EP | claimed |
| US-20260090293-A1 | SEMICONDUCTOR STACKS AND PROCESSES THEREOF | LAM RES CORP (US) | 2026-03-26 | — | — | US | disclosed |
| US-20260036908-A1 | INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER | LAM RES CORP (US) | 2026-02-05 | — | — | US | disclosed |
| EP-4681251-A1 | INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER | LAM Research Corporation (US) | 2026-01-21 | — | — | EP | disclosed |
| EP-4651192-A2 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | Lam Research Corporation (US) | 2025-11-19 | — | — | EP | disclosed |
| US-12474638-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-12474640-B2 | Integration of dry development and etch processes for EUV patterning in a single process chamber | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| WO-2008085804-A2 | SYSTEM AND METHOD OF COMPUTING AND RENDERING THE NATURE OF MOLECULES, MOLECULAR IONS, COMPOUNDS AND MATERIALS | BLACKLIGHT POWER, INC. (US) | 2008-07-17 | — | — | WO | disclosed |
| US-7038070-B2 | Preparation of preparing substituted indanones | BASELL POLYOLEFINE GMBH (DE) | 2006-05-02 | — | — | US | disclosed |
| US-6963017-B2 | Preparation of preparing substituted indanones | BASELL POLYOLEFINE GMBH (DE) | 2005-11-08 | — | — | US | disclosed |
| EP-0968158-B1 | METHOD OF PREPARING SUBSTITUTED INDANONES, THE SUBSTITUTED INDANONES AND METALLOCENES PREPARED THEREFROM | BASELL POLYOLEFINE GMBH (DE) | 2005-08-10 | — | — | EP | disclosed |
| US-20050033076-A1 | Preparation of preparing substituted indanones | EQUISTAR CHEMICALS, LP | 2005-02-10 | — | — | US | disclosed |
| US-20030009046-A1 | Preparation of preparing substituted indanones | EQUISTAR CHEMICALS, LP | 2003-01-09 | — | — | US | disclosed |
| US-20020197732-A1 | Method and apparatus for combinatorial screening of polymer compositions | GENERAL ELECTRIC COMPANY | 2002-12-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260090293-A1 | SEMICONDUCTOR STACKS AND PROCESSES THEREOF | PRPF3, PRPF4, MTREX | ALDH1A1 4370/4885CA4 2089/4885TSHR 4222/4885 |
| US-20120004440-A1 | PROCESS FOR PRODUCING COMPOUNDS COMPRISING NITRILE FUNCTIONS | NANP, NIT2, LPO | ALDH1A1 3068/4885CA4 12/4885TSHR 4256/4885 |
| US-20260036908-A1 | INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBER | ETV6, ETV1, CDV3 | ALDH1A1 4563/4885CA4 1169/4885TSHR 2405/4885 |
| US-20050033076-A1 | Preparation of preparing substituted indanones | CYP1A2, CYP2J2, IDH3A | ALDH1A1 317/4885CA4 4167/4885TSHR 4624/4885 |
| US-20030009046-A1 | Preparation of preparing substituted indanones | CYP1A2, CYP1B1, CYP1A1 | ALDH1A1 198/4885CA4 4047/4885TSHR 4667/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.