SCHEMBL24254796

SCHEMBL24254796

Fc1c(F)c(F)c(-c2c(F)c(F)c(N(c3cccc(-c4ccccc4-c4ccccc4)c3)c3c(F)c(F)c(-c4c(F)c(F)c(F)c(F)c4F)c(F)c3F)c(F)c2F)c(F)c1F

nearest known ligand 0.31

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
RPS6KA3 P51812 1/20 0.31
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
HNF4A P41235 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254797 0.87 MGLL (0.34) HNF4A
SCHEMBL24254698 0.80 AKR1C2 (0.34)
SCHEMBL1324131 0.79 BACE1 (0.41) CYP1A2CYP3A4CYP2C9CYP2C19HNF4A
SCHEMBL19998701 0.77 ALDH1A1 (0.41) CYP1A2CYP3A4CYP2C9CYP2C19HNF4A
SCHEMBL24254694 0.76 ALDH1A1 (0.35) CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL22079094 0.76 MGLL (0.41) CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL25639110 0.76 USP7 (0.33)
SCHEMBL24254702 0.75 SYK (0.32) CYP3A4
SCHEMBL24254700 0.75 CNR2 (0.33)
SCHEMBL22079086 0.74 PTGER1 (0.41) CYP1A2CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed