SCHEMBL24254700

SCHEMBL24254700

Fc1cccc(-c2cc(-c3cccc(F)c3F)cc(N(c3c(F)c(F)c(-c4c(F)c(F)c(F)c(F)c4F)c(F)c3F)c3c(F)c(F)c(-c4c(F)c(F)c(F)c(F)c4F)c(F)c3F)c2)c1F

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 1/20 0.33
WDR5 P61964 1/20 0.32
PGR P06401 1/20 0.32
DYRK1A Q13627 2/20 0.30
DHODH Q02127 2/20 0.30
PDE3B Q13370 1/20 0.30
PDE3A Q14432 1/20 0.30
WNT1 P04628 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254696 0.78
SCHEMBL24254697 0.78 TTR (0.35) PDE3BPDE3A
SCHEMBL24254705 0.77
SCHEMBL24254698 0.77 AKR1C2 (0.34)
SCHEMBL24254796 0.75 RPS6KA3 (0.31)
SCHEMBL25277672 0.74 PGR (0.39) CNR2WDR5PGRDYRK1A
SCHEMBL24254797 0.71 MGLL (0.34)
SCHEMBL25224763 0.70 WDR5 (0.42) CNR2WDR5PGRDYRK1ADHODH
SCHEMBL5949036 0.69 DHODH (0.43) CNR2WDR5PGRDHODH
SCHEMBL24254702 0.67 SYK (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed