SCHEMBL24254776

SCHEMBL24254776

Cc1cc(N(c2ccccc2)c2cc(C)cc(C(F)(F)F)c2)cc(C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS2R14 Q9NYV8 1/20 0.41
TACR1 P25103 4/20 0.41
ALDH1A1 P00352 2/20 0.40
TSHR P16473 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.36
POLQ O75417 3/20 0.36
KDM4E B2RXH2 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
MAPT P10636 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CETP P11597 1/20 0.35
KIF11 P52732 1/20 0.35
RAPGEF4 Q8WZA2 2/20 0.35
PGK1 P00558 1/20 0.34
PGK2 P07205 1/20 0.34
GPBAR1 Q8TDU6 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16707584 0.98 TAS2R14 (0.40) TAS2R14TACR1ALDH1A1TSHRL3MBTL1
SCHEMBL16386580 0.90 KIF11 (0.47) TAS2R14TACR1ALDH1A1TSHRKIF11
SCHEMBL14416256 0.89 RAPGEF4 (0.37) TAS2R14TACR1TSHRPOLQCETP
SCHEMBL23059913 0.87 ALDH1A1 (0.48) TACR1ALDH1A1TSHRL3MBTL1KDM4E
SCHEMBL25643314 0.87 ALDH1A1 (0.48) TACR1ALDH1A1TSHRL3MBTL1KDM4E
SCHEMBL24254779 0.86 TAS2R14 (0.44) TAS2R14TACR1ALDH1A1TSHRL3MBTL1
SCHEMBL16710463 0.85 ALDH1A1 (0.46) TACR1ALDH1A1TSHRL3MBTL1KDM4E
SCHEMBL24254823 0.85 TACR1 (0.34) TAS2R14TACR1POLQ
SCHEMBL24254822 0.85 TACR1 (0.34) TAS2R14TACR1POLQ
SCHEMBL24254777 0.83 ALDH1A1 (0.34) TAS2R14TACR1ALDH1A1POLQMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed