SCHEMBL24254779

SCHEMBL24254779

Cc1cc(N(c2ccc(Nc3ccccc3)cc2)c2cc(C)cc(C(F)(F)F)c2)cc(C(F)(F)F)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS2R14 Q9NYV8 1/20 0.44
HPGD P15428 1/20 0.43
RAPGEF4 Q8WZA2 3/20 0.41
NPSR1 Q6W5P4 1/20 0.40
ALDH1A1 P00352 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
IDH2 P48735 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39
GFER P55789 1/20 0.39
KMT2A Q03164 1/20 0.39
APP P05067 1/20 0.38
KCNH3 Q9ULD8 1/20 0.37
ALOX15 P16050 1/20 0.37
TSHR P16473 1/20 0.37
ALOX12 P18054 1/20 0.37
PTGS1 P23219 1/20 0.37
SLC6A2 P23975 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254753 0.93 TAS2R14 (0.41) TAS2R14HPGDRAPGEF4NPSR1ALDH1A1
SCHEMBL24254780 0.90 AKR1C3 (0.44) HPGDALDH1A1L3MBTL1IDH2KDM4E
SCHEMBL16707584 0.88 TAS2R14 (0.40) TAS2R14RAPGEF4ALDH1A1L3MBTL1KDM4E
SCHEMBL24254776 0.86 TAS2R14 (0.41) TAS2R14RAPGEF4ALDH1A1L3MBTL1KDM4E
SCHEMBL16386580 0.84 KIF11 (0.47) TAS2R14ALDH1A1TSHRKIF11FLT1
SCHEMBL14416256 0.83 RAPGEF4 (0.37) TAS2R14RAPGEF4TSHRMAPK1KIF11
SCHEMBL25644823 0.79 MEN1 (0.44) MEN1KMT2A
SCHEMBL24254777 0.77 ALDH1A1 (0.34) TAS2R14RAPGEF4ALDH1A1MAPTKIF11
SCHEMBL17955399 0.77 P2RX1 (0.40) TAS2R14RAPGEF4NPSR1MEN1GAA
SCHEMBL16710463 0.76 ALDH1A1 (0.46) ALDH1A1L3MBTL1KDM4EMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed