SCHEMBL2434770

SCHEMBL2434770

CCCCCCCCOc1ccc([S+](c2ccccc2)c2ccc(OCCCCCCCC)cc2)cc1.CCCCCCCCOc1ccc([S+](c2ccccc2)c2ccc(OCCCCCCCC)cc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.45
TSHR P16473 2/20 0.42
TP53 P04637 1/20 0.42
PLA2G4B P0C869 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
FAAH O00519 6/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
RARB P10826 3/20 0.40
NR5A1 Q13285 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2436488 0.98 LTA4H (0.45) LTA4HTSHRTP53PLA2G4BCA12
SCHEMBL29745929 0.95 LTA4H (0.47) LTA4HTSHRTP53PLA2G4BCA12
SCHEMBL2437617 0.95 TP53 (0.41) LTA4HTSHRTP53PLA2G4BFAAH
SCHEMBL2439305 0.92 TP53 (0.41) LTA4HTSHRTP53PLA2G4BFAAH
Trifluoromethanesulfonic Acid SCHEMBL4620123 0.92 LTA4H (0.48) LTA4HTSHRTP53PLA2G4BCA12
Trifluoromethanesulfonic Acid SCHEMBL4620191 0.92 LTA4H (0.48) LTA4HTSHRTP53PLA2G4BCA12
Trifluoromethanesulfonic Acid SCHEMBL7624035 0.92 LTA4H (0.48) LTA4HTSHRTP53PLA2G4BCA12
Trifluoromethanesulfonic Acid SCHEMBL7623512 0.92 LTA4H (0.48) LTA4HTSHRTP53PLA2G4BCA12
Trifluoromethanesulfonic Acid SCHEMBL3740931 0.92 LTA4H (0.48) LTA4HTSHRTP53PLA2G4BCA12
SCHEMBL3104515 0.91 TSHR (0.41) LTA4HTSHRTP53CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 EP claimed
US-7833693-B2 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity AZ ELECTRONIC MATERIALS USA CORP. 2010-11-16 US claimed
EP-2121783-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ Electronic Materials USA Corp. (US) 2009-11-25 EP claimed
US-7601480-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-10-13 US claimed
EP-2102184-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
EP-2102156-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
US-7521170-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-04-21 US claimed
US-20090087782-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2009-04-02 US claimed
US-7491482-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-02-17 US claimed
WO-2008087549-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-07-24 WO claimed
US-20080153032-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-26 US claimed
US-7390613-B1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-06-24 US claimed
WO-2008068617-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
WO-2008068610-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
US-20080131811-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 US claimed
US-20080131810-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 US claimed
EP-1915360-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2008-04-30 EP claimed
US-20080085463-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. 2008-04-10 US claimed
WO-2007007175-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2007-01-18 WO claimed
US-20070015084-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2007-01-18 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080131811-A1 Photoactive Compounds PRXL2A, PRDX2, AOC2 LTA4H 3194/4885TSHR 3855/4885TP53 4061/4885
US-20080131810-A1 Photoactive Compounds CRY2, AOC2, AFF2 LTA4H 3314/4885TSHR 3997/4885TP53 3946/4885
US-20080153032-A1 Photoactive Compounds SUN2, CRY2, SCO2 LTA4H 1170/4885TSHR 4095/4885TP53 4141/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.