Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.31 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.31 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.31 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.30 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2438995 | 0.97 | MEN1 (0.32) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL2437600 | 0.92 | CA1 (0.33) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL2437564 | 0.89 | CA1 (0.33) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL3421608 | 0.88 | CA1 (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3422375 | 0.83 | CA1 (0.34) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL2439021 | 0.83 | PTPN1 (0.31) | — | |
| SCHEMBL2439318 | 0.83 | ENPP3 (0.38) | MEN1KMT2AENPP3ENPP1 | |
| SCHEMBL2439557 | 0.82 | CA1 (0.34) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL2437745 | 0.81 | TDP1 (0.37) | MEN1NPC1RAB9AKMT2ASENP8 | |
| SCHEMBL2437907 | 0.80 | ENPP3 (0.39) | MEN1KMT2AENPP3ENPP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | claimed |
| EP-2121783-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | claimed |
| US-7601480-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | claimed |
| EP-2102184-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2102156-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | claimed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | claimed |
| US-7491482-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-02-17 | — | — | US | claimed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | claimed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | claimed |
| US-20080153032-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-26 | — | — | US | claimed |
| US-7390613-B1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-06-24 | — | — | US | claimed |
| WO-2008068617-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| WO-2008068610-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| US-20080131811-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| US-20080131810-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | claimed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | claimed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080131811-A1 | Photoactive Compounds | PRXL2A, PRDX2, AOC2 | MEN1 2428/4885NPC1 2604/4885RAB9A 2399/4885 |
| US-20080131810-A1 | Photoactive Compounds | CRY2, AOC2, AFF2 | MEN1 2308/4885NPC1 3013/4885RAB9A 2264/4885 |
| US-20080153032-A1 | Photoactive Compounds | SUN2, CRY2, SCO2 | MEN1 2182/4885NPC1 3527/4885RAB9A 1094/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.