SCHEMBL2437085

SCHEMBL2437085

O=S(=O)(O)c1c(F)c(F)c(C(F)(F)F)c(F)c1F

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.38
TSHR P16473 1/20 0.38
CA1 P00915 3/20 0.37
CA2 P00918 3/20 0.37
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
MMP8 P22894 1/20 0.34
MMP13 P45452 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
CA12 O43570 1/20 0.33
CA7 P43166 1/20 0.33
CA13 Q8N1Q1 1/20 0.33
F2 P00734 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2437090 0.88 CA1 (0.40) SMN1; SMN2TSHRCA1CA2MMP1
Perfluorotoluene SCHEMBL7708280 0.82 SMN1; SMN2 (0.42) SMN1; SMN2TSHRCA1CA2MMP1
SCHEMBL2875483 0.82 CA2 (0.48) SMN1; SMN2TSHRCA1CA2MMP1
SCHEMBL29119582 0.81 FABP3 (0.33) SMN1; SMN2TSHRMEN1KMT2A
SCHEMBL4371293 0.80 TSHR (0.30) SMN1; SMN2TSHR
SCHEMBL20101700 0.79 CA1 (0.38) CA1CA2MMP1MMP2MMP9
SCHEMBL36242 0.79 CA2 (0.52) TSHRCA1CA2MMP1MMP2
SCHEMBL778147 0.79 CA1 (0.32) CA1CA2MMP1MMP2MMP9
SCHEMBL9405052 0.78 SMN1; SMN2 (0.35) SMN1; SMN2TSHRCA1CA2MMP1
SCHEMBL794852 0.77 ALDH1A1 (0.31) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 EP claimed
US-7833693-B2 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity AZ ELECTRONIC MATERIALS USA CORP. 2010-11-16 US claimed
EP-2121783-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ Electronic Materials USA Corp. (US) 2009-11-25 EP claimed
EP-2111567-A2 PHOTORESIST COMPOSITION AZ Electronic Materials USA Corp. (US) 2009-10-28 EP claimed
US-7601480-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-10-13 US claimed
EP-2102184-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
EP-2102156-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 EP claimed
US-20090087782-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2009-04-02 US claimed
WO-2008096263-A2 PHOTORESIST COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-14 WO claimed
US-20080153032-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-26 US claimed
US-7390613-B1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-06-24 US claimed
WO-2008068617-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
WO-2008068610-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
US-20080131810-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 US claimed
EP-1915360-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2008-04-30 EP claimed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 WO claimed
US-20080085463-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. 2008-04-10 US claimed
WO-2007007175-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2007-01-18 WO claimed
US-20070015084-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2007-01-18 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080131810-A1 Photoactive Compounds CRY2, AOC2, AFF2 SMN1; SMN2 3834/4885TSHR 3997/4885CA1 1189/4885
US-20080153032-A1 Photoactive Compounds SUN2, CRY2, SCO2 SMN1; SMN2 2213/4885TSHR 4095/4885CA1 1059/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.