Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | KDM1A | O60341 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL59186 | 0.90 | ALDH1A1 (0.49) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL5527025 | 0.87 | MMP1 (0.53) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL952171 | 0.84 | KMT2A (0.49) | ALDH1A1HTTKMT2AMEN1RAB9A | |
| SCHEMBL8430876 | 0.83 | ALDH1A1 (0.55) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL28856088 | 0.83 | ALDH1A1 (0.44) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL30355298 | 0.82 | ALDH1A1 (0.43) | ALDH1A1HTTKMT2ATSHRMAOB | |
| SCHEMBL10401151 | 0.81 | CA2 (0.44) | ALDH1A1HTTMAOBSIGMAR1 | |
| SCHEMBL1089020 | 0.81 | ALDH1A1 (0.51) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL6175540 | 0.81 | ALDH1A1 (0.56) | ALDH1A1HTTKMT2ATSHRHPGD | |
| SCHEMBL14411092 | 0.81 | ALDH1A1 (0.55) | ALDH1A1HTTKMT2ATSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1563343-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-01-11 | — | — | EP | claimed |
| EP-1131678-B1 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | AZ ELECTRONIC MATERIALS USA (US) | 2009-07-08 | — | — | EP | claimed |
| US-7264913-B2 | Antireflective compositions for photoresists | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-09-04 | — | — | US | claimed |
| EP-1563343-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | Clariant International Ltd. (CH) | 2005-08-17 | — | — | EP | claimed |
| WO-2004046828-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-06-03 | — | — | WO | claimed |
| US-20040101779-A1 | Antireflective compositions for photoresists | MERCK PATENT GMBH (DE) | 2004-05-27 | — | — | US | claimed |
| EP-1131678-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2001-09-12 | — | — | EP | claimed |
| US-6114085-A | Antireflective composition for a deep ultraviolet photoresist | CLARIANT FINANCE (BVI) LIMITED (VG) | 2000-09-05 | — | — | US | claimed |
| WO-2000029906-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2000-05-25 | — | — | WO | claimed |
| US-12264075-B2 | Composition for forming silica layer and silica layer | SAMSUNG SDI CO., LTD. (KR) | 2025-04-01 | — | — | US | disclosed |
| CN-115572540-B | Composition for forming silicon dioxide layer, silicon dioxide layer and electronic device | 三星SDI株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-115703943-B | Composition for forming silicon dioxide layer, silicon dioxide layer and electronic device | 三星SDI株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| US-11518909-B2 | Composition for forming silica layer, manufacturing method for silica layer, and silica layer | SAMSUNG SDI CO., LTD. (KR) | 2022-12-06 | — | — | US | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| US-6866981-B2 | Mixture of cationic polymer containing unsaturated aromatic compound and sulfonated aromatic compound, photoinitiator and acid generator | MITSUBISHI PAPER MILLS LIMITED (JP) | 2005-03-15 | — | — | US | disclosed |
| US-20030190548-A1 | Mixture of cationic polymer containing unsaturated aromatic compound and sulfonated aromatic compound, photoinitiator and acid generator | MITSUBISHI PAPER MILLS LIMITED (JP) | 2003-10-09 | — | — | US | disclosed |
| EP-1131678-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2001-09-12 | — | — | EP | disclosed |
| US-6114085-A | Antireflective composition for a deep ultraviolet photoresist | CLARIANT FINANCE (BVI) LIMITED (VG) | 2000-09-05 | — | — | US | disclosed |
| WO-2000029906-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2000-05-25 | — | — | WO | disclosed |