Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL2455737

N.N.O.O.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Ammonia Solution, Strong. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112757511-A Preparation method of high-temperature-resistant anti-aging polyphenyl ether engineering plastic 南京逸科景润科技有限公司 2021-05-07 CN disclosed
EP-2365820-B1 ENDOTHELIUM MIMICKING NANOMATRIX UAB RESEARCH FOUNDATION (US) 2018-10-24 EP disclosed
CN-105789210-B Memory element and manufacturing method thereof 旺宏电子股份有限公司 2018-10-12 CN disclosed
CN-105304573-B Three-dimensional memory element and manufacturing method thereof 旺宏电子股份有限公司 2018-03-20 CN disclosed
CN-107293551-A Semiconductor structure and manufacturing method thereof 旺宏电子股份有限公司 2017-10-24 CN disclosed
CN-105789210-A Memory element and manufacturing method thereof 旺宏电子股份有限公司 2016-07-20 CN disclosed
CN-105304573-A Three-dimensional memory element and manufacturing method thereof MACRONIX INT CO LTD 2016-02-03 CN disclosed
US-8735354-B2 Endothelium mimicking nanomatrix UAB RESEARCH FOUNDATION (US) 2014-05-27 US disclosed
CN-101295540-B Method for enhancing retention characteristics of memory device MACRONIX INT CO LTD 2011-11-23 CN disclosed
EP-2365820-A2 ENDOTHELIUM MIMICKING NANOMATRIX UAB Research Foundation (US) 2011-09-21 EP disclosed
WO-2010054316-A2 ENDOTHELIUM MIMICKING NANOMATRIX UAB RESEARCH FOUNDATION (US) 2010-05-14 WO disclosed
US-20100119573-A1 ENDOTHELIUM MIMICKING NANOMATRIX UAB RESEARCH FOUNDATION 2010-05-13 US disclosed
CN-101295540-A Method for enhancing retention characteristics of memory device MACRONIX INT CO LTD (CN) 2008-10-29 CN disclosed
US-6333206-B1 MELTING LAMELLAR SOLID RESIN COMPRISING EPOXY RESIN, PHENOLIC RESIN AND FILLER INTERPOSED BETWEEN PRINTED CIRCUIT BOARD AND SEICONDUCTOR ELEMENT TO FORM UNDERFILL RESIN LAYER NITTO DENKO CORPORATION (JP) 2001-12-25 US disclosed
EP-0951064-A1 MANUFACTURE OF SEMICONDUCTOR DEVICE NITTO DENKO CORPORATION (JP) 1999-10-20 EP disclosed