SCHEMBL24564595

CC(C)(O)c1cc(OCC(COc2cc(C(C)(C)O)cc(C(C)(C)O)c2)(COc2cc(C(C)(C)O)cc(C(C)(C)O)c2)COc2cc(C(C)(C)O)cc(C(C)(C)N=O)c2)cc(C(C)(C)O)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
SCHEMBL24533749	0.87	HRH3 (0.32)	—
SCHEMBL24564761	0.73	HRH3 (0.30)	—
SCHEMBL9270383	0.70	NQO1 (0.42)	—
SCHEMBL24533756	0.69	HRH3 (0.49)	—
SCHEMBL24116187	0.68	SMN1; SMN2 (0.56)	—
SCHEMBL24533738	0.67	MAOB (0.38)	—
SCHEMBL24533730	0.67	HRH3 (0.37)	—
SCHEMBL18802918	0.66	APP (0.46)	—
SCHEMBL27908502	0.66	GABRA1 (0.40)	—
SCHEMBL548426	0.65	GABRA1 (0.35)	—

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
EP-4019489-A1	ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS	SHIN-ETSU CHEMICAL CO., LTD. (JP)	2022-06-29	—	—	EP	disclosed