Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 7/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.40 |
| ▸ | BAX | Q07812 | 1/20 | 0.40 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.34 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.34 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.34 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2222944 | 1.00 | LTA4H (0.44) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL686239 | 0.89 | LTA4H (0.55) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL686232 | 0.87 | LTA4H (0.60) | LTA4HTSHRNR1H2BAXMAOA | |
| Benzene SCHEMBL1705757 | 0.87 | IDO1 (0.35) | — | |
| SCHEMBL361169 | 0.87 | IDO1 (0.35) | — | |
| SCHEMBL5397497 | 0.84 | LTA4H (0.63) | LTA4HTSHRNR1H2BAXMAOA | |
| Water SCHEMBL10872926 | 0.82 | LTA4H (0.60) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL487535 | 0.82 | LTA4H (0.67) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL5430762 | 0.81 | LTA4H (0.46) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL17416086 | 0.80 | LTA4H (0.63) | LTA4HTSHRNR1H2BAXMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 618 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| EP-2513722-B1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION, PROCESS FOR MAKING A THREE-DIMENSIONAL OBJECT USING THE SAME | DSM IP ASSETS BV (NL) | 2017-01-25 | — | — | EP | claimed |
| US-9075306-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-2513722-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP Assets B.V. (NL) | 2012-10-24 | — | — | EP | claimed |
| US-20120259031-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2012-10-11 | — | — | US | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| WO-2011075555-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2011-06-23 | — | — | WO | claimed |
| EP-1497079-B1 | COATED ABRASIVE ARTICLE, METHOD FOR MAKING THE SAME AND METHODS OF ABRADING A WORKPIECE | 3M INNOVATIVE PROPERTIES CO (US) | 2008-05-21 | — | — | EP | claimed |
| EP-1497079-A1 | COATED ABRASIVE ARTICLE | 3M Innovative Properties Company (US) | 2005-01-19 | — | — | EP | claimed |
| US-6773474-B2 | PHOTOPOLYMERIZABLE COATING FOR PARTICLES; ABRASING SUBSTRATE | 3M INNOVATIVE PROPERTIES COMPANY | 2004-08-10 | — | — | US | claimed |
| WO-2003089194-A1 | COATED ABRASIVE ARTICLE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-10-30 | — | — | WO | claimed |
| US-20030200701-A1 | Coated abrasive article | 3M INNOVATIVE PROPERTIES COMPANY | 2003-10-30 | — | — | US | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| EP-0544842-A1 | ELECTRON BEAM CURABLE EPOXY COMPOSITIONS | CRIVELLO, James V. (US) | 1993-06-09 | — | — | EP | disclosed |
| WO-1992012183-A1 | ELECTRON BEAM CURABLE EPOXY COMPOSITIONS | CRIVELLO JAMES V (US) | 1992-07-23 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | LTA4H 1046/4885TSHR 2852/4885NR1H2 1557/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | LTA4H 1504/4885TSHR 3629/4885NR1H2 1778/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.