Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 7/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.48 |
| ▸ | BAX | Q07812 | 1/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.40 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.40 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.40 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686232 | 0.97 | LTA4H (0.60) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL5397497 | 0.95 | LTA4H (0.63) | LTA4HTSHRNR1H2BAXMAOA | |
| Water SCHEMBL10872926 | 0.92 | LTA4H (0.60) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL5430762 | 0.91 | LTA4H (0.46) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL686073 | 0.89 | HTT (0.52) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL685974 | 0.89 | HTT (0.52) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL2222944 | 0.89 | LTA4H (0.44) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL686351 | 0.89 | HTT (0.52) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL246393 | 0.89 | LTA4H (0.44) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL685346 | 0.87 | HTT (0.55) | LTA4HTSHRNR1H2BAXMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 173 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210061825-A1 | ANILINE DERIVATIVE AND USE THEREOF | NISSAN CHEMICAL CORPORATION (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-3766887-A1 | ANILINE DERIVATIVE AND USE THEREOF | Nissan Chemical Corporation (JP) | 2021-01-20 | — | — | EP | disclosed |
| WO-2020122113-A1 | CHARGE-TRANSPORTING VARNISH | 日産化学株式会社 | 2020-06-18 | — | — | WO | disclosed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9612533-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-04-04 | — | — | US | disclosed |
| US-9612533-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-04-04 | — | — | US | disclosed |
| US-9562032-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563123-B2 | Photoresist composition, compound and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563123-B2 | Photoresist composition, compound and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20070100158-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070100096-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-05-03 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070020479-A1 | Luminescent-polymer composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-01-25 | — | — | US | disclosed |
| US-7129014-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20040191674-A1 | Chemical amplification resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-09-30 | — | — | US | disclosed |
| US-20030236351-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITIED (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030219677-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030194639-A1 | Positive resist composition | FORTINET, INC. | 2003-10-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070100096-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | KCNH3, KCNN4, NHERF1 | LTA4H 2414/4885TSHR 1307/4885NR1H2 277/4885 |
| US-20210061825-A1 | ANILINE DERIVATIVE AND USE THEREOF | NAT1, DRD3, AR | LTA4H 3806/4885TSHR 798/4885NR1H2 484/4885 |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | HCN4, HCN3, HCN1 | LTA4H 3821/4885TSHR 1945/4885NR1H2 1016/4885 |
| US-10377692-B2 | Photoresist composition | C1R, C1S, F12 | LTA4H 353/4885TSHR 1598/4885NR1H2 1961/4885 |
| US-20070100158-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SLC26A3, RFC1, RFC2 | LTA4H 4249/4885TSHR 1154/4885NR1H2 918/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.