Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 5/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.40 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.40 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.40 |
| ▸ | PKM | P14618 | 2/20 | 0.40 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | NOS3 | P29474 | 2/20 | 0.33 |
| ▸ | NOS1 | P29475 | 2/20 | 0.33 |
| ▸ | NOS2 | P35228 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2474219 | 0.85 | LMNA (0.61) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL2474220 | 0.85 | LMNA (0.61) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL17991985 | 0.79 | LMNA (0.45) | LMNAMAPTNPC1RAB9ATDP1 | |
| SCHEMBL6517951 | 0.78 | MAPT (0.56) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL6517947 | 0.78 | MAPT (0.56) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL7862256 | 0.76 | LMNA (0.53) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL17709235 | 0.76 | LMNA (0.53) | LMNAMAPTNPC1RAB9ATSHR | |
| SCHEMBL12966535 | 0.76 | PPARA (0.58) | — | |
| SCHEMBL12966540 | 0.76 | LTA4H (0.60) | LMNAMAPTNPC1RAB9A | |
| SCHEMBL12966537 | 0.76 | CYP1A2 (0.46) | MAPTNPC1RAB9ATDP1PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-1160848-B1 | Composition for silica-based film formation | JSR CORP (JP) | 2011-10-05 | — | — | EP | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-7462678-B2 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-7297360-B2 | Insulation film | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| EP-1253175-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1146092-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-6465368-B2 | DISSOLVING POLYMER IN SOLVENT; FORMING DIELECTRIC FILMS | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |