SCHEMBL2476963

SCHEMBL2476963

Cc1ccc(S(=O)(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)[O-])cc1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 1/20 0.35
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
DHODH Q02127 1/20 0.33
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
GAA P10253 2/20 0.32
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
CA12 O43570 2/20 0.32
CA9 Q16790 2/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CYP3A4 P08684 2/20 0.32
CYP2C19 P33261 2/20 0.32
FFAR1 O14842 2/20 0.32
CDK1 P06493 1/20 0.32
CCNB1 P14635 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4125553 0.78 GAA (0.43) VDRHTTSMN1; SMN2KEAP1NFE2L2
SCHEMBL7702718 0.78 GPR3 (0.35) HTTSMN1; SMN2MEN1KMT2AGAA
SCHEMBL7708749 0.78 GPR3 (0.35) HTTSMN1; SMN2MEN1KMT2AGAA
SCHEMBL382709 0.77 CYP2D6 (0.40) VDRMEN1KMT2AGAAESR1
SCHEMBL482783 0.77 ALDH1A1 (0.33) HTTSMN1; SMN2MEN1KMT2ACYP3A4
SCHEMBL2476975 0.77 VDR (0.35) VDRHTTSMN1; SMN2DHODHKEAP1
Trifluoromethanesulfonic Acid SCHEMBL1088679 0.75 GPR3 (0.47) HTTSMN1; SMN2MEN1KMT2AGAA
Trifluoromethanesulfonic Acid SCHEMBL36147 0.75 GPR3 (0.47) HTTSMN1; SMN2MEN1KMT2AGAA
SCHEMBL2475711 0.75 VDR (0.36) VDRHTTSMN1; SMN2DHODHKEAP1
SCHEMBL30161534 0.74 GPR3 (0.39) HTTSMN1; SMN2MEN1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780198-B1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2011-10-05 EP disclosed
US-7531290-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-12 US disclosed
US-20070099112-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
EP-1780198-A1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-02 EP disclosed