SCHEMBL2476975

SCHEMBL2476975

Cc1ccc(S(=O)(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)OS(c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 1/20 0.35
HTT P42858 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
GAA P10253 2/20 0.33
BCHE P06276 2/20 0.33
ACHE P22303 2/20 0.33
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33
CA12 O43570 2/20 0.33
CA9 Q16790 2/20 0.33
HSD11B1 P28845 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CYP3A4 P08684 2/20 0.32
CYP2C19 P33261 2/20 0.32
LMNA P02545 1/20 0.32
MAPK1 P28482 1/20 0.32
ALDH1A1 P00352 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3136958 0.79 HTT (0.45) VDRHTTSMN1; SMN2MEN1KMT2A
SCHEMBL36148 0.79 HTT (0.45) VDRHTTSMN1; SMN2MEN1KMT2A
SCHEMBL4125553 0.79 GAA (0.43) VDRHTTSMN1; SMN2MEN1KMT2A
SCHEMBL382709 0.78 CYP2D6 (0.40) VDRMEN1KMT2AGAABCHE
SCHEMBL2476963 0.77 VDR (0.35) VDRHTTSMN1; SMN2MEN1KMT2A
SCHEMBL4127451 0.76 CA1 (0.43) SMN1; SMN2KMT2AGAACA12CA9
SCHEMBL482785 0.75 MGLL (0.37) HTTMEN1KMT2AGAAHSD11B1
SCHEMBL12039700 0.75 TSHR (0.39) SMN1; SMN2MEN1KMT2AGAACA9
SCHEMBL2955938 0.74 VDR (0.49) VDRHTTSMN1; SMN2MEN1KMT2A
SCHEMBL2962485 0.74 VDR (0.49) VDRHTTSMN1; SMN2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1780198-B1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2011-10-05 EP disclosed
US-7531290-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-12 US disclosed
US-20070099112-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
EP-1780198-A1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-02 EP disclosed