Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 4/20 | 0.42 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 4/20 | 0.42 |
| ▸ | CA9 | Q16790 | 4/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36148 | 1.00 | HTT (0.45) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL36225 | 0.95 | GAA (0.45) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL37033 | 0.89 | HTR6 (0.42) | HTTSMN1; SMN2CA12CA9CA1 | |
| SCHEMBL9135546 | 0.88 | ACHE (0.46) | GAABCHEACHEHSD11B1ALDH1A1 | |
| SCHEMBL8374963 | 0.87 | BCHE (0.45) | HTTGAABCHEACHECA12 | |
| SCHEMBL8862179 | 0.87 | ACHE (0.42) | HTTGAABCHEACHECA1 | |
| SCHEMBL444803 | 0.86 | PTGS2 (0.44) | HSD11B1 | |
| SCHEMBL1593709 | 0.86 | HSD11B1 (0.40) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL1615718 | 0.85 | CYP1A2 (0.42) | SMN1; SMN2HSD11B1ALDH1A1CYP1A2CYP3A4 | |
| SCHEMBL219926 | 0.85 | CA1 (0.41) | HTTSMN1; SMN2GAABCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12338309-B2 | Dielectric film-forming composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-24 | — | — | US | disclosed |
| US-20240254268-A1 | Dielectric Film-Forming Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | disclosed |
| US-11945894-B2 | Dielectric film-forming composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-04-02 | — | — | US | disclosed |
| EP-4176001-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-05-10 | — | — | EP | disclosed |
| EP-4118679-A1 | METAL DEPOSITION PROCESSES | Fujifilm Electronic Materials U.S.A., Inc. (US) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022005783-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-01-06 | — | — | WO | disclosed |
| US-20220002463-A1 | Dielectric Film-Forming Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2022-01-06 | — | — | US | disclosed |
| WO-2021183472-A1 | METAL DEPOSITION PROCESSES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-09-16 | — | — | WO | disclosed |
| US-20210287939-A1 | Metal Deposition Processes | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-09-16 | — | — | US | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| WO-2001022163-A2 | RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-03-29 | — | — | WO | disclosed |
| US-6165682-A | Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-12-26 | — | — | US | disclosed |
| US-6146793-A | TERPOLYMER WITH CHEMICALLY AMPLIFIED (ACID LABILE) MOIETIES AND ORGANOSILICON MOIETIES SUITABLE FOR USE AS THE BINDER RESIN FOR A PHOTOIMAGEABLE RESIST PHOTORESIST COMPOSITION SUITABLE FOR USE IN 193 NM PHOTOLITHOGRAPHIC PROCESSES. | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-11-14 | — | — | US | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| WO-1999042903-A1 | RADIATION SENSITIVE TERPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND 193 nm BILAYER SYSTEMS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-08-26 | — | — | WO | disclosed |
| US-5916995-A | Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-06-29 | — | — | US | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |