Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 4/20 | 0.42 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 4/20 | 0.42 |
| ▸ | CA9 | Q16790 | 4/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3136958 | 1.00 | HTT (0.45) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL36225 | 0.95 | GAA (0.45) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL37033 | 0.89 | HTR6 (0.42) | HTTSMN1; SMN2CA12CA9CA1 | |
| SCHEMBL9135546 | 0.88 | ACHE (0.46) | GAABCHEACHEHSD11B1ALDH1A1 | |
| SCHEMBL8374963 | 0.87 | BCHE (0.45) | HTTGAABCHEACHECA12 | |
| SCHEMBL8862179 | 0.87 | ACHE (0.42) | HTTGAABCHEACHECA1 | |
| SCHEMBL444803 | 0.86 | PTGS2 (0.44) | HSD11B1 | |
| SCHEMBL1593709 | 0.86 | HSD11B1 (0.40) | HTTSMN1; SMN2GAABCHEACHE | |
| SCHEMBL1615718 | 0.85 | CYP1A2 (0.42) | SMN1; SMN2HSD11B1ALDH1A1CYP1A2CYP3A4 | |
| SCHEMBL219926 | 0.85 | CA1 (0.41) | HTTSMN1; SMN2GAABCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 982 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| US-20150152328-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | MERCK PATENT GMBH (DE) | 2015-06-04 | — | — | US | claimed |
| EP-2856519-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | Merck Patent GmbH (DE) | 2015-04-08 | — | — | EP | claimed |
| WO-2013182265-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | MERCK PATENT GMBH (DE) | 2013-12-12 | — | — | WO | claimed |
| EP-0955563-B1 | A photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2003-03-19 | — | — | EP | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | claimed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4714988-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0738928-A2 | Visible-ray polymerization initiator and visible-ray polymerizable composition | TOKUYAMA CORPORATION (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |