Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 15/20 | 0.37 |
| ▸ | CA1 | P00915 | 14/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.37 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30385143 | 1.00 | CA2 (0.37) | CA2CA1HSD11B1MMP1MMP2 | |
| SCHEMBL1760814 | 1.00 | CA2 (0.37) | CA2CA1HSD11B1MMP1MMP2 | |
| SCHEMBL31651407 | 0.99 | HSD11B1 (0.38) | CA2CA1HSD11B1MMP1MMP2 | |
| SCHEMBL545789 | 0.99 | HSD11B1 (0.38) | CA2CA1HSD11B1MMP1MMP2 | |
| SCHEMBL30295388 | 0.92 | CA2 (0.34) | CA2CA1HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL29851847 | 0.84 | HSD11B1 (0.43) | HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL59634 | 0.84 | HSD11B1 (0.43) | HSD11B1 | |
| Perflubutane SCHEMBL5665288 | 0.83 | ALDH1A1 (0.39) | CA2HSD11B1 | |
| SCHEMBL29562559 | 0.83 | CA1 (0.32) | CA2CA1HSD11B1MMP1MMP2 | |
| SCHEMBL31627575 | 0.82 | CA2 (0.38) | CA2CA1HSD11B1MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | claimed |
| US-7651831-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-01-26 | — | — | US | claimed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | claimed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | claimed |
| EP-1664923-A4 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | IBM (US) | 2008-08-27 | — | — | EP | claimed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | claimed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | claimed |
| US-7217496-B2 | Fluorinated photoresist materials with improved etch resistant properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-05-15 | — | — | US | claimed |
| US-20050164507-A1 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-07-28 | — | — | US | claimed |
| US-20050153232-A1 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-07-14 | — | — | US | claimed |
| WO-2005036261-A1 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-04-21 | — | — | WO | claimed |
| US-20050058930-A1 | Negative resist composition with fluorosulfonamide-containing polymer | GLOBALFOUNDRIES U.S. INC. | 2005-03-17 | — | — | US | claimed |
| US-6821718-B2 | EXHIBIT HIGH RESISTANCE TO REACTIVE ION ETCHING IN EMPLOYING OXYGEN AND/OR CHLORINE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-11-23 | — | — | US | claimed |
| US-20040048204-A1 | Radiation sensitive silicon-containing negative resists and use thereof | INTERNATIONAL BUSINESS MACHINES | 2004-03-11 | — | — | US | claimed |
| US-6653045-B2 | Negative resist containing a polysilsesquioxane polymer with pendant fused rings and sites for reaction with a crosslinking agent, an acid-sensitive glycolurils ascrosslinking agent, and a radiation sensitive generator | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-11-25 | — | — | US | claimed |
| US-20020115017-A1 | Radiation sensitive silicon-containing negative resists and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-08-22 | — | — | US | claimed |
| US-6344305-B1 | AMPLIFIED SILICON-CONTAINING NEGATIVE-TONE RESIST COMPOSITION OF AQUEOUS BASE SOLUBLE SILICON-CONTAINING POLYMER HAVING PHENOLIC GROUP FOR O-ALKYLATION; ACID CATALYZABLE CROSSLINKING AGENT; ACID GENERATOR; SOLVENT; PHOTOSENSITIZER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-02-05 | — | — | US | claimed |
| US-6187505-B1 | MIXTURE COMPRISING POLYSILSESQUIOXANE HAVING PHENOLIC GROUPS CROSSLINKABLE WITH ACID CATALYZABLE CURING AGENT, ACID GENERATOR, PHOTOSENSITIZER, A BASE AND SURFACTANT; PATTERN RESOLUTION WITH HIGH ASPECT RATIO | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | claimed |