SCHEMBL2484913

SCHEMBL2484913

C=C(CCO)C(=O)OC(=O)CCC(=O)O

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
EGLN1 Q9GZT9 3/20 0.36
KDM6B O15054 1/20 0.36
KDM5C P41229 1/20 0.36
PHF8 Q9UPP1 1/20 0.36
KDM2A Q9Y2K7 1/20 0.36
LMNA P02545 3/20 0.36
ALKBH5 Q6P6C2 1/20 0.36
SUCNR1 Q9BXA5 1/20 0.36
CAMK2A Q9UQM7 1/20 0.34
GPR84 Q9NQS5 1/20 0.32
FFAR1 O14842 1/20 0.32
FFAR4 Q5NUL3 1/20 0.32
SLC15A2 Q16348 1/20 0.30
MAPK1 P28482 1/20 0.30
SLC13A3 Q8WWT9 1/20 0.30
OR51E2 Q9H255 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11118250 0.92 ALDH1A1 (0.33)
SCHEMBL9868910 0.80
SCHEMBL11423528 0.78 ALOX15 (0.35)
SCHEMBL2937206 0.78 LMNA (0.47) EGLN1KDM6BKDM5CPHF8KDM2A
SCHEMBL1146717 0.78 LMNA (0.53) EGLN1KDM6BKDM5CPHF8KDM2A
SCHEMBL3579858 0.77 TSHR (0.44) LMNACAMK2AGPR84FFAR1FFAR4
Propanol SCHEMBL5859525 0.76 ALDH1A1 (0.39) EGLN1KDM6BKDM5CPHF8KDM2A
SCHEMBL1252855 0.75 EGLN1 (0.43) EGLN1KDM6BKDM5CPHF8KDM2A
Alcohol SCHEMBL9000867 0.74 EGLN1 (0.39) EGLN1KDM6BKDM5CPHF8KDM2A
SCHEMBL5479192 0.74 MGAM (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-59038270-A None JP disclosed
EP-1410109-B1 PHOTOSENSITIVE RESIN COMPOSITION BASF SE (DE) 2011-10-26 EP disclosed
US-7829257-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. (US) 2010-11-09 US disclosed
US-7556843-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORPORATION (US) 2009-07-07 US disclosed
US-7425585-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORPORATION (US) 2008-09-16 US disclosed
EP-1095313-B1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS CIBA SC HOLDING AG (CH) 2008-03-05 EP disclosed
US-20070259278-A1 Photosensitive resin composition IGM GROUP B.V. (NL) 2007-11-08 US disclosed
US-20070249748-A1 Photosensitive resin composition IGM GROUP B.V. (NL) 2007-10-25 US disclosed
US-7247659-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORPORATION (US) 2007-07-24 US disclosed
US-20040192804-A1 Photosensitive resin composition IGM GROUP B.V. (NL) 2004-09-30 US disclosed
EP-1410109-A1 PHOTOSENSITIVE RESIN COMPOSITION Ciba SC Holding AG (CH) 2004-04-21 EP disclosed
WO-2003010602-A1 PHOTOSENSITIVE RESIN COMPOSITION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-02-06 WO disclosed
US-6485885-B1 Photopolymerizable thermosetting resin compositions CIBA SPECIALTY CHEMICALS CORPORATION 2002-11-26 US disclosed
US-20020020832-A1 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. 2002-02-21 US disclosed
EP-1095313-A1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS Ciba SC Holding AG (CH) 2001-05-02 EP disclosed
WO-2000000869-A1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-01-06 WO disclosed
JP-S5938270-A PREPARATION OF FILM-SHAPED ADHESIVE DAINIPPON PRINTING CO LTD 1984-03-02 JP disclosed