SCHEMBL2489255

SCHEMBL2489255

CCCCCCCCCCCC(CCC)C(=O)O

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.73
AKR1A1 P14550 1/20 0.73
CHRM3 P20309 1/20 0.73
HTR2A P28223 1/20 0.73
HTR2C P28335 1/20 0.73
ADRA1A P35348 1/20 0.73
HRH1 P35367 1/20 0.73
DRD3 P35462 1/20 0.73
SLC6A3 Q01959 1/20 0.73
HDAC1 Q13547 1/20 0.73
HDAC2 Q92769 1/20 0.73
TDP1 Q9NUW8 1/20 0.73
GRIK1 P39086 3/20 0.63
GRIK2 Q13002 3/20 0.63
CA2 P00918 2/20 0.61
MAPK1 P28482 1/20 0.61
SLC1A2 P43004 3/20 0.60
SLC1A1 P43005 3/20 0.60
GPR84 Q9NQS5 6/20 0.59
FFAR1 O14842 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1943942 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1115851 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
Arundic Acid SCHEMBL277260 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
Arundic Acid SCHEMBL3450562 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL3630645 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1115797 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL15499898 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL432094 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1115939 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1115977 1.00 CHRM1 (0.73) CHRM1AKR1A1CHRM3HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115433832-B Nickel and cobalt synergistic extractant and application thereof 中国科学院过程工程研究所 2024-03-19 CN claimed
CN-116969489-A Method for removing magnesium from salt lake brine 中国科学院过程工程研究所 2023-10-31 CN claimed
CN-115433832-A Nickel and cobalt synergistic extraction agent and application thereof 中国科学院过程工程研究所 2022-12-06 CN claimed
EP-2644185-B1 THICK CLEANING COMPOSITION SUZHOU ELECO CHEMICAL IND CO LTD (CN) 2018-04-25 EP claimed
EP-2644185-A1 THICK CLEANING COMPOSITION Suzhou Yuansuji Chemical Industry Co., Ltd. (CN) 2013-10-02 EP claimed
US-20130251648-A1 THICK CLEANING COMPOSITION SUZHOU YUANSUJI CHEMICAL INDUSTRY CO., LTD. (CN) 2013-09-26 US claimed
US-20050153869-A1 Fatty acids, soaps, surfactant systems, and consumer products based thereon THE PROCTER & GAMBLE COMPANY 2005-07-14 US claimed
US-12564879-B2 Copper paste for joining, method for manufacturing joined body, and joined body RESONAC CORPORATION (JP) 2026-03-03 US disclosed
EP-4692226-A1 SOLUTION, DISPERSANT, METHOD FOR PRODUCING VINYL COMPOUND POLYMER, AND METHOD FOR PRODUCING SOLUTION Kuraray Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260028721-A1 METHOD FOR MANUFACTURING SUBSTRATE WITH CONDUCTIVE VIAS AND METHOD FOR MANUFACTURING WIRING BOARD WITH CONDUCTIVE VIAS RESONAC CORP (JP) 2026-01-29 US disclosed
EP-4674910-A1 COMPOSITION COMPRISING VINYL ALCOHOL-BASED POLYMER, AND METHOD FOR SEPARATING VINYL ALCOHOL-BASED POLYMER Kuraray Co., Ltd. (JP) 2026-01-07 EP disclosed
US-20250387833-A1 METHOD FOR MANUFACTURING CONDUCTIVE VIA-CONTAINING SUBSTRATE, CONDUCTIVE VIA-CONTAINING SUBSTRATE, AND METAL PASTE RESONAC CORP (JP) 2025-12-25 US disclosed
US-20250293091-A1 METHOD FOR PRODUCING SUBSTRATE HAVING THROUGH-SILICON VIAS, SUBSTRATE HAVING THROUGH-SILICON VIAS, AND COPPER PASTE FOR THROUGH-SILICON VIA FORMATION RESONAC CORPORATION (JP) 2025-09-18 US disclosed
US-20030100469-A1 Fatty acids, soaps, surfactant systems, and consumer products based thereon CONNOR DANIEL STEDMAN (US) 2003-05-29 US disclosed
US-6569829-B1 Removing impurities from a long chain N-acyl acidic amino acid such as N-lauroyl-L-glutamic acid containing an inorganic salt by solvent extraction using a solution of water and tert-butanol; use in cosmetics and detergents ASAHI KASEI KABUSHIKI KAISHA (JP) 2003-05-27 US disclosed
US-6395701-B1 MIXTURE PROCTER & GAMBLE COMPANY, THE 2002-05-28 US disclosed
EP-1156033-A1 PROCESS FOR PRODUCING ACIDIC N-(LONG-CHAIN ACYL)AMINO ACID Asahi Kasei Kabushiki Kaisha (JP) 2001-11-21 EP disclosed
EP-1025190-A2 FATTY ACIDS, SOAPS, SURFACTANT SYSTEMS, AND CONSUMER PRODUCTS BASED THEREON THE PROCTER & GAMBLE COMPANY (US) 2000-08-09 EP disclosed
WO-1999020722-A2 FATTY ACIDS, SOAPS, SURFACTANT SYSTEMS, AND CONSUMER PRODUCTS BASED THEREON THE PROCTER & GAMBLE COMPANY (US) 1999-04-29 WO disclosed
US-4767783-A MIXTURE OF FATTY ACID GLYCERIDE AND TERPENE KAO CORPORATION (JP) 1988-08-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250387833-A1 METHOD FOR MANUFACTURING CONDUCTIVE VIA-CONTAINING SUBSTRATE, CONDUCTIVE VIA-CONTAINING SUBSTRATE, AND METAL PASTE C5, C9, CUTA CHRM1 1447/4885AKR1A1 4523/4885CHRM3 1819/4885
US-20260028721-A1 METHOD FOR MANUFACTURING SUBSTRATE WITH CONDUCTIVE VIAS AND METHOD FOR MANUFACTURING WIRING BOARD WITH CONDUCTIVE VIAS PIEZO1, CACNA1C, GJB2 CHRM1 1367/4885AKR1A1 3596/4885CHRM3 994/4885
US-12564879-B2 Copper paste for joining, method for manufacturing joined body, and joined body DCX, DNAJA2, DNAJA1 CHRM1 3681/4885AKR1A1 2313/4885CHRM3 3123/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.