SCHEMBL24901030

SCHEMBL24901030

O=C(Oc1cc(F)c(F)c(F)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.38
CES1 P23141 3/20 0.38
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA4 P22748 2/20 0.31
MAOB P27338 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10180733 0.83 CES2 (0.39) CES2CES1CA1CA2CA4
SCHEMBL10181736 0.82 CES2 (0.41) CES2CES1CA1CA2CA4
SCHEMBL24901099 0.82 CES2 (0.37) CES2CES1MAOB
SCHEMBL24901032 0.79 CES2 (0.31) CES2CES1
SCHEMBL24142228 0.76 ELANE (0.41) CES2CES1
SCHEMBL24901029 0.74 CES2 (0.34) CES2CES1
SCHEMBL21810571 0.73 CES2 (0.48) CES2CES1CA1CA2CA4
SCHEMBL24142221 0.73 ALDH1A1 (0.46) MAOB
SCHEMBL24901074 0.72 TSHR (0.32)
SCHEMBL24901031 0.71 CES2 (0.37) CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR CES2 1660/4885CES1 3887/4885CA1 1590/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.