SCHEMBL24901099

SCHEMBL24901099

O=C(Oc1ccc(F)c(F)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.37
CES1 P23141 1/20 0.37
SOS1 Q07889 1/20 0.36
ELANE P08246 7/20 0.35
MAOB P27338 2/20 0.35
MAOA P21397 1/20 0.35
AOC3 Q16853 1/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
SLC1A3 P43003 1/20 0.33
SLC1A2 P43004 1/20 0.33
SLC1A1 P43005 1/20 0.33
GRIN1 Q05586 1/20 0.32
GRIN2B Q13224 1/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
ALDH1A1 P00352 1/20 0.32
KCNN4 O15554 1/20 0.32
CYP4F2 P78329 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10181495 0.84 CES2 (0.38) CES2CES1SOS1ELANEMAOB
SCHEMBL10180514 0.84 CES2 (0.41) CES2CES1SOS1ELANEMAOB
SCHEMBL24901030 0.82 CES2 (0.38) CES2CES1MAOB
SCHEMBL24142228 0.80 ELANE (0.41) CES2CES1ELANEALDH1A1
SCHEMBL24901072 0.79 ELANE (0.51) ELANEMAPT
SCHEMBL24901075 0.77 BCHE (0.43) POLBALDH1A1
SCHEMBL18697358 0.75 CES2 (0.46) CES2CES1SOS1MAOBMAOA
SCHEMBL24901178 0.75 EPHX2 (0.49) ELANENPC1POLBMAPTALDH1A1
SCHEMBL24179235 0.75 ELANE (0.40) ELANEALDH1A1
SCHEMBL24142316 0.75 KIF11 (0.54) CES2CES1ELANEMAOBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR CES2 1660/4885CES1 3887/4885SOS1 1704/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.