Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.35 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.35 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.35 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.32 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.32 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ALPG | P10696 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | FAAH | O00519 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24945943 | 0.85 | POLB (0.39) | LMNAKMT2AMAPK1 | |
| SCHEMBL24945942 | 0.81 | HSD11B1 (0.36) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| SCHEMBL24142228 | 0.70 | ELANE (0.41) | ALDH1A1SMN1; SMN2FAAHKMT2A | |
| SCHEMBL6090576 | 0.70 | CYP1A2 (0.37) | ABHD6 | |
| SCHEMBL6090567 | 0.70 | CYP1A2 (0.37) | ABHD6 | |
| SCHEMBL12282257 | 0.67 | AOC3 (0.42) | ALDH1A1IDO1TDO2 | |
| SCHEMBL24177943 | 0.67 | KMT2A (0.44) | LMNASMN1; SMN2IDO1KMT2A | |
| SCHEMBL24901028 | 0.67 | ABHD6 (0.34) | ABHD6 | |
| SCHEMBL24142485 | 0.66 | HSD11B1 (0.44) | ADRB2ADRB1ADRB3ALDH1A1SMN1; SMN2 | |
| SCHEMBL24177827 | 0.66 | HCAR2 (0.49) | ALDH1A1LMNAKMT2ARORC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230019681-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |