SCHEMBL24901183

SCHEMBL24901183

N#Cc1ccc(OC(=O)C(O)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.43
PARP15 Q460N3 1/20 0.42
PARP10 Q53GL7 1/20 0.42
PARP2 Q9UGN5 1/20 0.42
POLB P06746 2/20 0.42
MGLL Q99685 2/20 0.42
MAPT P10636 3/20 0.41
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
LMNA P02545 1/20 0.41
PKM P14618 1/20 0.41
MAPK1 P28482 1/20 0.41
RAB9A P51151 1/20 0.41
KMT2A Q03164 1/20 0.41
IL18 Q14116 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MMP2 P08253 1/20 0.40
CA2 P00918 3/20 0.39
CA9 Q16790 2/20 0.39
CA12 O43570 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28327501 0.84 F2 (0.46) F2PARP15PARP10PARP2POLB
SCHEMBL24142228 0.79 ELANE (0.41) KDM4EMEN1KMT2AALDH1A1
SCHEMBL27945029 0.77 ELANE (0.63) F2PARP15PARP10PARP2POLB
SCHEMBL26163156 0.77 LMNA (0.52) MEN1LMNAKMT2AALDH1A1CA2
SCHEMBL24179235 0.77 ELANE (0.40) ALDH1A1CA2CA9CA1GSK3B
SCHEMBL24901072 0.77 ELANE (0.51) MAPTMEN1KMT2APDK1PDK2
SCHEMBL24142316 0.77 KIF11 (0.54) ALDH1A1CA2CA9CYP11B1CA1
SCHEMBL24901178 0.77 EPHX2 (0.49) POLBMAPTMEN1RAB9AKMT2A
SCHEMBL24142221 0.77 ALDH1A1 (0.46) POLBMAPTKDM4EALDH1A1PDK1
SCHEMBL24142271 0.76 GAA (0.44) MAPTMEN1RAB9AKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR F2 4365/4885PARP15 2281/4885PARP10 2518/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.