SCHEMBL24901072

SCHEMBL24901072

O=C(Oc1ccc(Cl)cc1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.51
CYP11B1 P15538 5/20 0.41
CYP11B2 P19099 4/20 0.41
CYP1A2 P05177 2/20 0.41
CYP3A4 P08684 2/20 0.41
PPARA Q07869 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
CYP2D6 P10635 1/20 0.41
MAPT P10636 1/20 0.41
CYP2C19 P33261 1/20 0.41
PDK1 Q15118 1/20 0.40
PDK2 Q15119 1/20 0.40
PDK3 Q15120 1/20 0.40
PDK4 Q16654 1/20 0.40
LIPE Q05469 3/20 0.40
ABCB11 O95342 1/20 0.39
TSHR P16473 1/20 0.39
HTR2A P28223 1/20 0.39
PMP22 Q01453 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142228 0.83 ELANE (0.41) ELANECYP1A2MEN1KMT2AHPGD
SCHEMBL10738024 0.82 ELANE (0.56) ELANECYP11B1CYP11B2CYP1A2CYP3A4
SCHEMBL24179235 0.81 ELANE (0.40) ELANE
SCHEMBL26163156 0.81 LMNA (0.52) ELANECYP1A2MEN1KMT2ACYP2C19
SCHEMBL24142316 0.81 KIF11 (0.54) ELANECYP11B1CYP11B2
SCHEMBL24901178 0.81 EPHX2 (0.49) ELANECYP3A4MEN1KMT2AMAPT
SCHEMBL24142221 0.81 ALDH1A1 (0.46) ELANEMAPTPDK1PDK2PDK3
SCHEMBL24901075 0.80 BCHE (0.43) MEN1KMT2A
SCHEMBL24901099 0.79 CES2 (0.37) ELANEMAPT
SCHEMBL24901182 0.77 PTPRZ1 (0.44) ELANEMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR ELANE 2121/4885CYP11B1 4820/4885CYP11B2 4684/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.