SCHEMBL24901178

SCHEMBL24901178

O=C(Oc1ccc(OC(F)(F)F)cc1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.49
L3MBTL1 Q9Y468 1/20 0.44
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
TRPV1 Q8NER1 3/20 0.41
MAPT P10636 2/20 0.41
KMT2A Q03164 2/20 0.41
GAA P10253 1/20 0.41
ELANE P08246 2/20 0.40
AURKA O14965 1/20 0.40
TPX2 Q9ULW0 1/20 0.40
POLB P06746 1/20 0.39
FAAH O00519 1/20 0.39
MEN1 O00255 1/20 0.38
ALDH1A1 P00352 1/20 0.38
TP53 P04637 1/20 0.38
CYP3A4 P08684 1/20 0.38
ALOX15 P16050 1/20 0.38
TSHR P16473 1/20 0.38
BLM P54132 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142228 0.83 ELANE (0.41) KMT2AGAAELANEFAAHMEN1
SCHEMBL24142316 0.81 KIF11 (0.54) EPHX2TRPV1ELANEALDH1A1
SCHEMBL26163156 0.81 LMNA (0.52) KMT2AGAAELANEMEN1ALDH1A1
SCHEMBL24901072 0.81 ELANE (0.51) MAPTKMT2AELANEMEN1CYP3A4
SCHEMBL24179235 0.81 ELANE (0.40) TRPV1GAAELANEALDH1A1
SCHEMBL24142221 0.81 ALDH1A1 (0.46) L3MBTL1MAPTELANEPOLBALDH1A1
SCHEMBL24901093 0.78 L3MBTL1 (0.43) EPHX2L3MBTL1POLB
SCHEMBL23493346 0.78 EPHX2 (0.57) EPHX2L3MBTL1NPC1RAB9ATRPV1
SCHEMBL10339425 0.78 EPHX2 (0.57) EPHX2NPC1RAB9ATRPV1MAPT
SCHEMBL24901183 0.77 F2 (0.43) RAB9AMAPTKMT2APOLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR EPHX2 4060/4885L3MBTL1 2700/4885NPC1 4730/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.