SCHEMBL24908565

SCHEMBL24908565

C=C(C)C(=O)OC(c1ccc(O)cc1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.40
ESR2 Q92731 4/20 0.40
KIF11 P52732 1/20 0.35
LMNA P02545 2/20 0.34
CYP3A4 P08684 2/20 0.34
TYR P14679 1/20 0.34
AR P10275 1/20 0.34
HPGD P15428 1/20 0.34
TSHR P16473 1/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
HTR6 P50406 1/20 0.34
ESRRG P62508 1/20 0.34
SLC6A3 Q01959 1/20 0.34
HSD17B10 Q99714 1/20 0.34
MAPT P10636 2/20 0.34
NPSR1 Q6W5P4 1/20 0.34
KDM4E B2RXH2 1/20 0.33
TP53 P04637 1/20 0.33
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10396191 0.93 NPSR1 (0.37) LMNAHPGDHSD17B10MAPTNPSR1
SCHEMBL7084775 0.87 RORC (0.38) LMNAMAPTNPSR1SMN1; SMN2
SCHEMBL15840364 0.86 SMN1; SMN2 (0.47) LMNANPSR1SMN1; SMN2
SCHEMBL3692621 0.85 ELANE (0.41) LMNATSHRMAPTNPSR1KDM4E
SCHEMBL26861526 0.83 ESR1 (0.39) ESR1ESR2KIF11LMNACYP3A4
SCHEMBL26862665 0.82 CYP3A4 (0.37) KIF11LMNACYP3A4MAPTNPSR1
SCHEMBL26794304 0.82 ESR1 (0.41) ESR1ESR2ARTP53
SCHEMBL2465362 0.81 PGK1 (0.40) NPSR1TP53GAAL3MBTL1ALDH1A1
SCHEMBL26794329 0.80 ESR1 (0.32) ESR1LMNAMAPTNPSR1
SCHEMBL10396190 0.79 LMNA (0.38) ESR1ESR2KIF11LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 US disclosed
WO-2023157526-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND, AND RESIN 富士フイルム株式会社 2023-08-24 WO disclosed
WO-2023002869-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2023-01-26 WO disclosed