SCHEMBL24943705

SCHEMBL24943705

O=C(OC1(c2ccccc2)CCNCC1)c1cccc2cc(O)ccc12

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 2/20 0.37
GFER P55789 1/20 0.36
OPRM1 P35372 2/20 0.35
PTPN1 P18031 1/20 0.35
KMT2A Q03164 2/20 0.34
GAA P10253 2/20 0.34
POLB P06746 1/20 0.34
MEN1 O00255 1/20 0.34
ESR1 P03372 1/20 0.34
PKM P14618 1/20 0.34
ESR2 Q92731 1/20 0.34
TRPV1 Q8NER1 1/20 0.33
HTR5A P47898 1/20 0.33
ROCK2 O75116 1/20 0.33
RXFP1 Q9HBX9 1/20 0.33
NR4A1 P22736 1/20 0.33
NR4A2 P43354 1/20 0.33
NR4A3 Q92570 1/20 0.33
SOS1 Q07889 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944294 0.88 NR4A1 (0.44) CDC25BOPRM1PTPN1KMT2AGAA
SCHEMBL24943740 0.88 OPRM1 (0.39) CDC25BOPRM1PTPN1KMT2APOLB
SCHEMBL24943764 0.87 KDM4E (0.43) OPRM1KMT2AGAAMEN1ROCK2
SCHEMBL24944843 0.82 CA12 (0.43) OPRM1
SCHEMBL24944199 0.82 SERPINE1 (0.46) OPRM1KMT2AGAAMEN1
SCHEMBL24944876 0.82 ESR1 (0.41) OPRM1KMT2AMEN1ESR1PKM
SCHEMBL24944297 0.81 OPRM1 (0.38) OPRM1KMT2AMEN1ESR1PKM
SCHEMBL24944312 0.81 RAB9A (0.42) OPRM1ESR1ESR2
SCHEMBL24944936 0.80 SMN1; SMN2 (0.40) OPRM1KMT2AGAAMEN1
SCHEMBL24944311 0.79 HPGD (0.44) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CDC25B 4525/4885GFER 76/4885OPRM1 775/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.