SCHEMBL24944843

SCHEMBL24944843

O=C(OC1(c2ccccc2)CCNCC1)c1cc(O)ccc1O

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA12 O43570 4/20 0.43
CA1 P00915 4/20 0.43
CA2 P00918 4/20 0.43
CA7 P43166 4/20 0.43
CA9 Q16790 4/20 0.43
CA14 Q9ULX7 4/20 0.43
GUSB P08236 1/20 0.41
ALOX5 P09917 1/20 0.41
PTGS2 P35354 1/20 0.41
OPRM1 P35372 2/20 0.39
EGFR P00533 4/20 0.36
ACHE P22303 1/20 0.35
CHRNA7 P36544 1/20 0.35
TACR1 P25103 1/20 0.35
ALOX5AP P20292 1/20 0.34
HDAC1 Q13547 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944199 0.90 SERPINE1 (0.46) CA12CA1CA2CA7CA9
SCHEMBL24944227 0.88 MEN1 (0.45) OPRM1TACR1
SCHEMBL26478639 0.88 GSTA1 (0.43) OPRM1HDAC1
SCHEMBL26413484 0.88 CSNK2A1 (0.43) OPRM1TACR1HDAC1
SCHEMBL24944305 0.88 MEN1 (0.38) OPRM1TACR1
SCHEMBL24944876 0.87 ESR1 (0.41) OPRM1
SCHEMBL24944311 0.87 HPGD (0.44) CA12CA1CA2CA7CA9
SCHEMBL24944297 0.86 OPRM1 (0.38) OPRM1TACR1
SCHEMBL24944936 0.85 SMN1; SMN2 (0.40) OPRM1
SCHEMBL26413429 0.83 ALDH1A1 (0.35) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CA12 2480/4885CA1 1910/4885CA2 472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.