⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24944344 | 0.89 | LGALS9 (0.34) | — | |
| SCHEMBL24944347 | 0.86 | — | — | |
| SCHEMBL24944348 | 0.86 | LGALS9 (0.34) | — | |
| SCHEMBL26479482 | 0.85 | — | — | |
| SCHEMBL24944358 | 0.84 | OPRK1 (0.33) | — | |
| SCHEMBL26426957 | 0.81 | — | — | |
| SCHEMBL26413959 | 0.81 | RAB9A (0.37) | — | |
| SCHEMBL24944627 | 0.81 | OPRM1 (0.32) | — | |
| SCHEMBL26426986 | 0.81 | — | — | |
| SCHEMBL24944360 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |