SCHEMBL26413484

SCHEMBL26413484

Cc1ccc(O)c(C(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A1 P68400 1/20 0.43
OPRM1 P35372 2/20 0.42
MEN1 O00255 2/20 0.37
RAB9A P51151 2/20 0.37
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
TACR1 P25103 1/20 0.37
KLF10 Q13118 1/20 0.36
MAPT P10636 2/20 0.36
HPGD P15428 1/20 0.36
HTT P42858 1/20 0.36
HDAC1 Q13547 1/20 0.36
NPC1 O15118 1/20 0.36
TP53 P04637 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
GABRD O14764 1/20 0.34
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34
GABRA5 P31644 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413482 0.90 OPRM1 (0.42) OPRM1MEN1RAB9AKMT2AKDM4E
SCHEMBL24944093 0.89 OPRM1 (0.43) OPRM1MEN1KMT2AKDM4ETACR1
SCHEMBL24944843 0.88 CA12 (0.43) OPRM1TACR1HDAC1
SCHEMBL26413497 0.87 P2RX7 (0.44) OPRM1MEN1RAB9AKMT2AKDM4E
SCHEMBL26478777 0.87 OPRM1 (0.44) OPRM1TACR1MAPTHDAC1TP53
SCHEMBL24944858 0.86 OPRM1 (0.43) OPRM1MEN1RAB9AKMT2ATACR1
SCHEMBL24944227 0.86 MEN1 (0.45) OPRM1MEN1RAB9AKMT2AKDM4E
SCHEMBL26478639 0.85 GSTA1 (0.43) OPRM1MEN1KMT2AKDM4ELMNA
SCHEMBL24944311 0.84 HPGD (0.44) OPRM1RAB9AKDM4ELMNAMAPT
SCHEMBL26478772 0.84 OPRM1 (0.44) OPRM1RAB9ATACR1MAPTHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CSNK2A1 159/4885OPRM1 775/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.