SCHEMBL24944856

SCHEMBL24944856

O=C(COc1c(Cl)cc(Cl)cc1Cl)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TACR1 P25103 4/20 0.40
OPRM1 P35372 4/20 0.38
KMT2A Q03164 1/20 0.37
DRD3 P35462 1/20 0.36
ACLY P53396 3/20 0.36
SLC6A4 P31645 3/20 0.35
KCNH2 Q12809 3/20 0.35
OPRD1 P41143 3/20 0.35
OPRK1 P41145 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943648 0.86 TDP1 (0.50)
SCHEMBL24944847 0.83 KMT2A (0.44) OPRM1KMT2A
SCHEMBL24944846 0.83 MEN1 (0.43) OPRM1KMT2A
SCHEMBL24944608 0.81 OPRM1 (0.44) OPRM1KMT2ADRD3OPRD1OPRK1
SCHEMBL24944888 0.81 OPRM1 (0.45) OPRM1KMT2ADRD3OPRD1OPRK1
SCHEMBL24944242 0.80 MAPT (0.50) KMT2A
SCHEMBL24943695 0.79 TACR1 (0.41) TACR1OPRM1KMT2ASLC6A4KCNH2
SCHEMBL26413527 0.79 TP53 (0.44) TACR1OPRM1KMT2ASLC6A4
SCHEMBL24944596 0.77 OPRM1 (0.48) TACR1OPRM1DRD3OPRD1OPRK1
SCHEMBL24944252 0.77 OPRM1 (0.47) TACR1OPRM1DRD3OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TACR1 2183/4885OPRM1 775/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.