SCHEMBL24944846

SCHEMBL24944846

O=C(COc1ccccc1Cl)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
POLB P06746 4/20 0.42
RAB9A P51151 4/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
MAPT P10636 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
RECQL P46063 1/20 0.42
HTT P42858 3/20 0.41
HPGD P15428 2/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
TP53 P04637 1/20 0.41
L3MBTL1 Q9Y468 3/20 0.41
NPC1 O15118 2/20 0.41
KDM4E B2RXH2 2/20 0.41
ALDH1A1 P00352 1/20 0.41
GAA P10253 1/20 0.41
SSTR1 P30872 1/20 0.40
SSTR4 P31391 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943648 0.89 TDP1 (0.50) POLBRAB9ASMN1; SMN2MAPTTDP1
SCHEMBL24943733 0.85 POLB (0.50) MEN1KMT2APOLBRAB9ASMN1; SMN2
SCHEMBL24944710 0.83 ALDH1A1 (0.52) MEN1KMT2ASMN1; SMN2MAPTTDP1
SCHEMBL24944273 0.83 PARP1 (0.43) MEN1KMT2APOLBRAB9AMAPT
SCHEMBL24944856 0.83 TACR1 (0.40) KMT2AOPRM1
SCHEMBL24944608 0.83 OPRM1 (0.44) MEN1KMT2AL3MBTL1ALDH1A1GAA
SCHEMBL24944847 0.83 KMT2A (0.44) MEN1KMT2APOLBSMN1; SMN2MAPT
SCHEMBL24944242 0.82 MAPT (0.50) MEN1KMT2APOLBSMN1; SMN2MAPT
SCHEMBL26413601 0.81 ALDH1A1 (0.51) MEN1KMT2APOLBRAB9ASMN1; SMN2
SCHEMBL26413532 0.80 AKR1B1 (0.43) MEN1KMT2ASMN1; SMN2ALDH1A1OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MEN1 3578/4885KMT2A 1033/4885POLB 154/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.