SCHEMBL24944862

SCHEMBL24944862

COc1cccc(OC)c1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 1/20 0.46
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
OPRM1 P35372 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.40
DRD2 P14416 1/20 0.39
MEN1 O00255 4/20 0.39
KMT2A Q03164 4/20 0.39
CCR8 P51685 2/20 0.38
KCNH2 Q12809 1/20 0.38
ALDH1A1 P00352 1/20 0.38
USP2 O75604 1/20 0.37
CYP2D6 P10635 1/20 0.37
TAAR1 Q96RJ0 1/20 0.36
SLC6A9 P48067 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944250 0.93 SIGMAR1 (0.42) SIGMAR1CA12CA1CA2CA7
SCHEMBL24944282 0.90 SIGMAR1 (0.41) SIGMAR1CA12CA1CA2CA7
SCHEMBL24944283 0.89 TACR1 (0.43) SIGMAR1OPRM1MEN1KMT2AALDH1A1
SCHEMBL26413478 0.87 SIGMAR1 (0.46) SIGMAR1OPRM1L3MBTL1DRD2MEN1
SCHEMBL24944289 0.86 NCEH1 (0.42) SIGMAR1OPRM1MEN1KMT2AALDH1A1
SCHEMBL24944222 0.85 SIGMAR1 (0.42) SIGMAR1OPRM1L3MBTL1MEN1KMT2A
SCHEMBL24944652 0.85 SIGMAR1 (0.42) SIGMAR1OPRM1L3MBTL1MEN1KMT2A
SCHEMBL24944092 0.85 KMT2A (0.49) SIGMAR1OPRM1MEN1KMT2AALDH1A1
SCHEMBL24944861 0.85 OPRM1 (0.48) OPRM1SLC6A9
SCHEMBL26413463 0.83 OPRM1 (0.43) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SIGMAR1 327/4885CA12 2480/4885CA1 1910/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.