SCHEMBL24944282

SCHEMBL24944282

COc1ccc(OC)c(C(=O)OC2(c3ccccc3)CCNCC2)c1OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 1/20 0.41
OPRM1 P35372 3/20 0.40
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
DRD2 P14416 1/20 0.35
ALOX5 P09917 1/20 0.35
SLC6A9 P48067 1/20 0.35
MAPT P10636 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.34
POLB P06746 1/20 0.34
GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944862 0.90 SIGMAR1 (0.46) SIGMAR1OPRM1MEN1KMT2AL3MBTL1
SCHEMBL24944689 0.88 PKM (0.44) SIGMAR1OPRM1MEN1KMT2AL3MBTL1
SCHEMBL24944280 0.86 OPRM1 (0.39) SIGMAR1OPRM1L3MBTL1ALDH1A1GAA
SCHEMBL24944289 0.86 NCEH1 (0.42) SIGMAR1OPRM1MEN1KMT2AMAPT
SCHEMBL24944092 0.85 KMT2A (0.49) SIGMAR1OPRM1MEN1KMT2ATDP1
SCHEMBL24944250 0.85 SIGMAR1 (0.42) SIGMAR1OPRM1MEN1KMT2AL3MBTL1
SCHEMBL24944693 0.84 L3MBTL1 (0.48) SIGMAR1OPRM1MEN1KMT2AL3MBTL1
SCHEMBL24944283 0.84 TACR1 (0.43) SIGMAR1OPRM1MEN1KMT2ASLC6A9
SCHEMBL26413478 0.82 SIGMAR1 (0.46) SIGMAR1OPRM1MEN1KMT2AL3MBTL1
SCHEMBL24944094 0.81 NPC1 (0.47) MEN1KMT2AL3MBTL1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SIGMAR1 327/4885OPRM1 775/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.