SCHEMBL24944283

SCHEMBL24944283

COc1cc(OC)c(C(=O)OC2(c3ccccc3)CCNCC2)c(OC)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TACR1 P25103 1/20 0.43
KMT2A Q03164 3/20 0.42
MAPT P10636 2/20 0.42
CYP3A4 P08684 2/20 0.42
TP53 P04637 1/20 0.42
ATM Q13315 1/20 0.42
HSD17B10 Q99714 1/20 0.42
HTR6 P50406 1/20 0.41
SIGMAR1 Q99720 1/20 0.40
OPRM1 P35372 1/20 0.40
MEN1 O00255 1/20 0.39
ABCG2 Q9UNQ0 1/20 0.39
SLC6A9 P48067 1/20 0.38
PTPN1 P18031 1/20 0.38
ABCB1 P08183 2/20 0.38
EDNRB P24530 1/20 0.37
EDNRA P25101 1/20 0.37
USP2 O75604 1/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944862 0.89 SIGMAR1 (0.46) KMT2ASIGMAR1OPRM1MEN1SLC6A9
SCHEMBL24943720 0.86 KMT2A (0.50) KMT2AMAPTMEN1ABCG2ABCB1
SCHEMBL24944850 0.85 TACR1 (0.47) TACR1KMT2AHSD17B10OPRM1MEN1
SCHEMBL24944282 0.84 SIGMAR1 (0.41) TACR1KMT2AMAPTATMSIGMAR1
SCHEMBL24943724 0.83 CYP3A4 (0.46) KMT2AMAPTCYP3A4MEN1ABCG2
SCHEMBL26479359 0.83 TACR1 (0.43) TACR1OPRM1PTPN1
SCHEMBL24944293 0.82 ALDH1A1 (0.51) KMT2AMAPTATMHSD17B10SIGMAR1
SCHEMBL24944250 0.82 SIGMAR1 (0.42) KMT2AMAPTCYP3A4TP53HSD17B10
SCHEMBL24944281 0.81 KMT2A (0.43) TACR1KMT2AMAPTCYP3A4HSD17B10
SCHEMBL26413477 0.81 OPRM1 (0.47) TACR1KMT2AMAPTCYP3A4OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TACR1 2183/4885KMT2A 1033/4885MAPT 2648/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.