SCHEMBL24948263

SCHEMBL24948263

C=Cc1ccc(C(=O)OC2(C)CCOC2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.35
TAS1R1 Q7RTX1 2/20 0.35
RARB P10826 2/20 0.34
RARG P13631 2/20 0.34
RARA P10276 1/20 0.34
ALDH1A1 P00352 2/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
MGLL Q99685 1/20 0.33
HSD17B10 Q99714 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
RAB9A P51151 2/20 0.33
NPC1 O15118 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
PIM1 P11309 1/20 0.32
SNCA P37840 1/20 0.32
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24948267 0.92 ALDH1A1 (0.38) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL14527796 0.81 CYP19A1 (0.38) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL1900520 0.81 LMNA (0.38) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL1901746 0.81 RARB (0.34) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL17247256 0.80 CYP19A1 (0.40) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL25964048 0.78 MEN1 (0.31) TAS1R3TAS1R1ALDH1A1RAB9ANPC1
SCHEMBL1898338 0.77 RARB (0.35) RARBRARGALDH1A1PIM1SNCA
SCHEMBL1897164 0.75 TAS1R3 (0.35) TAS1R3TAS1R1RARBRARGRARA
SCHEMBL25960367 0.75
SCHEMBL14665535 0.75 TAS1R3 (0.39) TAS1R3TAS1R1ALDH1A1RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008347-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed