SCHEMBL1900520

SCHEMBL1900520

C=Cc1ccc(C(=O)OC2(C)CCOC(=O)C2)cc1

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
CYP2C9 P11712 1/20 0.38
RARB P10826 3/20 0.37
RARG P13631 3/20 0.37
RARA P10276 2/20 0.37
TAS1R3 Q7RTX0 2/20 0.33
TAS1R1 Q7RTX1 2/20 0.33
PIM1 P11309 1/20 0.33
SNCA P37840 1/20 0.33
RASGRP3 Q8IV61 4/20 0.32
PRKCA P17252 3/20 0.32
PRKCE Q02156 3/20 0.32
ALDH1A1 P00352 2/20 0.31
MAPK1 P28482 1/20 0.30
MAPT P10636 1/20 0.30
HPGD P15428 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898338 0.87 RARB (0.35) RARBRARGPIM1SNCARASGRP3
SCHEMBL24948267 0.83 ALDH1A1 (0.38) LMNACYP2C9RARBRARGRARA
SCHEMBL1901036 0.82 TAS1R3 (0.34) LMNACYP2C9RARBRARGRARA
SCHEMBL24948263 0.81 TAS1R3 (0.35) CYP2C9RARBRARGRARATAS1R3
SCHEMBL1901746 0.80 RARB (0.34) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1901246 0.80 RARB (0.38) RARBRARGRARATAS1R3TAS1R1
SCHEMBL14527796 0.78 CYP19A1 (0.38) CYP2C9RARBRARGRARATAS1R3
SCHEMBL1897164 0.78 TAS1R3 (0.35) RARBRARGRARATAS1R3TAS1R1
SCHEMBL17247256 0.77 CYP19A1 (0.40) LMNACYP2C9RARBRARGRARA
SCHEMBL1481810 0.76 LMNA (0.46) LMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed