SCHEMBL2494854

SCHEMBL2494854

N#Cc1ccccc1C1(C2(c3ccccc3C#N)N=C(c3ccccc3)C(c3ccccc3)=N2)N=C(c2ccccc2)C(c2ccccc2)=N1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.37
NPSR1 Q6W5P4 2/20 0.37
TDP1 Q9NUW8 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
HIF1A Q16665 1/20 0.36
GABRG2 P18507 1/20 0.36
GABRB3 P28472 1/20 0.36
GABRA5 P31644 1/20 0.36
GABRA3 P34903 1/20 0.36
TSHR P16473 2/20 0.36
ADORA2A P29274 1/20 0.36
ADORA1 P30542 1/20 0.36
KDM4E B2RXH2 4/20 0.36
HPGD P15428 4/20 0.36
LRRK2 Q5S007 1/20 0.36
CLK4 Q9HAZ1 1/20 0.36
LMNA P02545 2/20 0.35
HTT P42858 1/20 0.35
RXFP1 Q9HBX9 1/20 0.35
THRB P10828 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8665705 0.83 POLB (0.48) ALDH1A1TDP1SMN1; SMN2TSHRADORA2A
SCHEMBL2492843 0.82 GABRA1 (0.37) ALDH1A1NPSR1TDP1SMN1; SMN2GABRG2
SCHEMBL2497219 0.80 PARP10 (0.40) ALDH1A1TDP1SMN1; SMN2HIF1AKDM4E
SCHEMBL2496306 0.75 ALDH1A1 (0.37) ALDH1A1NPSR1TDP1SMN1; SMN2HIF1A
SCHEMBL8665932 0.73 IDO1 (0.37) ALDH1A1TDP1SMN1; SMN2GABRG2GABRB3
SCHEMBL81799 0.72 ALDH1A1 (0.38) ALDH1A1NPSR1TDP1SMN1; SMN2TSHR
SCHEMBL82274 0.72 TAAR1 (0.40) ALDH1A1SMN1; SMN2TSHRKDM4EHPGD
SCHEMBL155813 0.72 ALDH1A1 (0.34) ALDH1A1SMN1; SMN2TSHRHPGDMAPK1
SCHEMBL30987503 0.72 ALDH1A1 (0.34) ALDH1A1SMN1; SMN2TSHRHPGDMAPK1
SCHEMBL80409 0.72 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TSHRMAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed