SCHEMBL24950118

SCHEMBL24950118

CS(c1ccccc1)(c1ccccc1)c1ccccc1OC(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ HTR6 P50406 3/20 0.40
▸ ALPL P05186 1/20 0.38
▸ CNR2 P34972 2/20 0.38
▸ RXRA P19793 1/20 0.38
▸ RXRB P28702 1/20 0.38
▸ RXRG P48443 1/20 0.38
▸ SLC22A12 Q96S37 3/20 0.37
▸ SLC40A1 Q9NP59 1/20 0.37
▸ KDM2B Q8NHM5 1/20 0.36
▸ BRD4 O60885 1/20 0.35
▸ PTGDR2 Q9Y5Y4 2/20 0.35
▸ PTGES2 Q9H7Z7 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ HSD11B1 P28845 1/20 0.34
▸ RORC P51449 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22954102 0.79 HTR6 (0.61) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL2646108 0.78 ALPL (0.46) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL6972429 0.72 ALPL (0.47) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL3528957 0.72 ELANE (0.60) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL21216562 0.71 HTR6 (0.48) HTR6ALPLSLC22A12SLC40A1KDM2B
SCHEMBL4654446 0.71 RXRA (0.47) RXRARXRBRXRGALDH1A1L3MBTL1
SCHEMBL10646541 0.70 SLC22A12 (0.48) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL6039108 0.70 SLC22A12 (0.48) HTR6ALPLCNR2SLC22A12SLC40A1
SCHEMBL645001 0.70 ALPL (0.46) HTR6ALPLRXRARXRBRXRG
SCHEMBL692280 0.70 PTGES2 (0.55) HTR6ALPLSLC22A12SLC40A1KDM2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 — — WO disclosed
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