SCHEMBL250355

SCHEMBL250355

O=S(=O)(O)c1sc(S(=O)(=O)O)c2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.44
TSHR P16473 1/20 0.44
TTR P02766 1/20 0.38
GPR3 P46089 1/20 0.36
CHAT P28329 1/20 0.35
SNCA P37840 1/20 0.35
CYP2D6 P10635 2/20 0.34
LDHA P00338 1/20 0.34
POLB P06746 1/20 0.34
MPL P40238 2/20 0.34
ALDH1A1 P00352 3/20 0.33
SLC22A6 Q4U2R8 1/20 0.33
ALOX15 P16050 1/20 0.33
CYP1A2 P05177 1/20 0.33
COMT P21964 1/20 0.32
AURKA O14965 1/20 0.32
AURKB Q96GD4 1/20 0.32
PADI4 Q9UM07 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL788508 0.73 HSD11B1 (0.47) GPR3POLBALDH1A1ALOX15LMNA
SCHEMBL7116533 0.73 MCL1 (0.51) SMN1; SMN2GPR3POLBALDH1A1LMNA
SCHEMBL309805 0.72 TSHR (0.37) SMN1; SMN2TSHRTTRCYP2D6MPL
SCHEMBL14879315 0.70 TSHR (0.50) SMN1; SMN2TSHRTTRGPR3CYP2D6
Dibenzothiophene SCHEMBL29061713 0.70 GPR3 (0.70) SMN1; SMN2GPR3POLBALDH1A1ALOX15
SCHEMBL29409575 0.69 TTR (0.61) SMN1; SMN2TSHRTTRSNCALDHA
SCHEMBL2524546 0.69 TSHR (0.48) SMN1; SMN2TSHRTTRCYP2D6LDHA
SCHEMBL703189 0.69 TTR (0.61) SMN1; SMN2TSHRTTRSNCALDHA
Sulfuric Acid SCHEMBL391429 0.67 SMN1; SMN2 (0.46) SMN1; SMN2TSHRTTRCHATSNCA
SCHEMBL7710380 0.67 TTR (0.59) SMN1; SMN2TSHRTTRSNCALDHA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11189430-B2 Electrolytic capacitor and method for producing same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-11-30 US disclosed
US-20200168404-A1 ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING SAME PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2020-05-28 US disclosed
US-20200082994-A1 ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2020-03-12 US disclosed
US-8674317-B2 Sample surface inspection apparatus and method EBARA CORPORATION (JP) 2014-03-18 US disclosed
US-8673748-B2 Method for fabricating semiconductor thin film using substrate irradiated with focused light, apparatus for fabricating semiconductor thin film using substrate irradiated with focused light, method for selectively growing semiconductor thin film using substrate irradiated with focused light, and semiconductor element using substrate irradiated with focused light OSAKA UNIVERSITY (JP) 2014-03-18 US disclosed
EP-2557416-A2 Sample surface inspection apparatus and method Ebara Corporation (JP) 2013-02-13 EP disclosed
US-20120049063-A1 SAMPLE SURFACE INSPECTION APPARATUS AND METHOD EBARA CORPORATION (JP) 2012-03-01 US disclosed
US-20120001302-A1 METHOD FOR FABRICATING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, APPARATUS FOR FABRICATING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, METHOD FOR SELECTIVELY GROWING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, AND SEMICONDUCTOR ELEMENT USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT OSAKA UNIVERSITY (JP) 2012-01-05 US disclosed
EP-1495312-A4 SAMPLE SURFACE INSPECTION APPARATUS AND METHOD EBARA CORP (JP) 2008-12-17 EP disclosed
US-20080265159-A1 Sample surface inspection apparatus and method EBARA CORPORATION (JP) 2008-10-30 US disclosed
US-7391036-B2 Sample surface inspection apparatus and method EBARA CORPORATION (JP) 2008-06-24 US disclosed
US-20050158653-A1 Sample surface inspection apparatus and method EBARA CORPORATION (JP) 2005-07-21 US disclosed
EP-1495312-A1 SAMPLE SURFACE INSPECTION APPARATUS AND METHOD Ebara Corporation (JP) 2005-01-12 EP disclosed
WO-2003087797-A1 SAMPLE SURFACE INSPECTION APPARATUS AND METHOD EBARA CORPORATION (JP) 2003-10-23 WO disclosed