SCHEMBL309805

SCHEMBL309805

O=S(=O)(O)c1scc2ccccc12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP2D6 P10635 1/20 0.37
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
CNR2 P34972 1/20 0.34
CTRB1 P17538 1/20 0.34
ALDH1A1 P00352 3/20 0.33
HSD17B10 Q99714 3/20 0.33
CYP1A2 P05177 3/20 0.33
MPL P40238 2/20 0.33
CYP2C19 P33261 2/20 0.33
CYP2C9 P11712 1/20 0.33
ALOX15 P16050 1/20 0.33
ATIC P31939 1/20 0.33
HIF1A Q16665 1/20 0.33
CTRC Q99895 1/20 0.33
F2 P00734 1/20 0.33
PRSS1 P07477 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4423326 0.82 CA2 (0.48) CA1CA2CA9CYP2C9
SCHEMBL1156731 0.80 PAX8 (0.38) TSHRCA1CA2CA9CNR2
Ammonia Solution, Strong SCHEMBL7416278 0.78 PAX8 (0.36) TSHRCA1CA2CA9CNR2
SCHEMBL250355 0.72 SMN1; SMN2 (0.44) TSHRSMN1; SMN2CYP2D6ALDH1A1CYP1A2
SCHEMBL10467411 0.71 CA1 (0.42) CA1CA2ALDH1A1HSD17B10CYP1A2
SCHEMBL8798918 0.71 MTNR1A (0.35) CA1CA2ALDH1A1CYP1A2CYP2C19
SCHEMBL392930 0.68 CYP2D6 (0.61) TSHRSMN1; SMN2CYP2D6CTRB1ALDH1A1
SCHEMBL14879315 0.68 TSHR (0.50) TSHRSMN1; SMN2CYP2D6CYP1A2MPL
SCHEMBL276253 0.67 ALDH1A1 (0.39) TSHRCYP2D6CNR2ALDH1A1HSD17B10
SCHEMBL276255 0.67 CYP1A2 (0.42) TSHRCNR2ALDH1A1HSD17B10CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7083105-B2 IC card and method of operating the same FUJITSU LIMITED (JP) 2006-08-01 US claimed
US-20030169574-A1 IC card and method of operating the same FUJITSU LIMITED (JP) 2003-09-11 US claimed
CN-114561159-A Surface protective film 日东电工株式会社 2022-05-31 CN disclosed
US-11043680-B2 Electrode material including small diameter, carbon nanotubes bridging large diameter carbon nanotubes, redox flow battery electrode, redox flow battery, and method for producing electrode material SHOWA DENKO K.K. (JP) 2021-06-22 US disclosed
US-10727498-B2 Redox flow battery electrode, and redox flow battery SHOWA DENKO K.K. (JP) 2020-07-28 US disclosed
EP-3240071-B1 ELECTRODE FOR REDOX FLOW BATTERIES, AND REDOX FLOW BATTERY SHOWA DENKO KK (JP) 2020-07-22 EP disclosed
EP-3070771-B1 ELECTRODE MATERIAL, REDOX FLOW BATTERY ELECTRODE, REDOX FLOW BATTERY, AND METHOD FOR PRODUCING SAID ELECTRODE MATERIAL SHOWA DENKO KK (JP) 2018-08-22 EP disclosed
CN-105706279-B Electrode material, electrode for redox flow battery, and method for producing electrode material 昭和电工株式会社 2018-08-03 CN disclosed
US-20180126408-A1 METHOD FOR MANUFACTURING CARBON NANOTUBE COMPOSITE SHEET SHOWA DENKO K.K. (JP) 2018-05-10 US disclosed
EP-3296260-A1 METHOD FOR MANUFACTURING CARBON NANOTUBE COMPOSITE SHEET Showa Denko K.K. (JP) 2018-03-21 EP disclosed
US-20180034066-A1 REDOX FLOW BATTERY ELECTRODE, AND REDOX FLOW BATTERY SHOWA DENKO K.K. (JP) 2018-02-01 US disclosed
WO-2007001076-A1 SOLID ELECTROLYTIC CAPACITOR AND PRODUCTION METHOD THEREOF SHOWA DENKO K.K. (JP) 2007-01-04 WO disclosed
CN-1890823-A Polymer for anode buffer layer, coating solution for anode buffer layer, and organic light emitting device SHOWA DENKO KK (JP) 2007-01-03 CN disclosed
EP-1728256-A1 CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE Showa Denko K.K. (JP) 2006-12-06 EP disclosed
US-7083105-B2 IC card and method of operating the same FUJITSU LIMITED (JP) 2006-08-01 US disclosed
WO-2006033455-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2006-03-30 WO disclosed
US-20060057426-A1 Thiophene derivative and organic electroluminescent element DAI NIPPON PRINTING CO., LTD. 2006-03-16 US disclosed
WO-2006016670-A1 ANTISTATIC AGENT, ANTISTATIC FILM AND PRODUCT COATED WITH ANTISTATIC FILM SHOWA DENKO K.K. (JP) 2006-02-16 WO disclosed
WO-2005091309-A1 CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE SHOWA DENKO K.K. (JP) 2005-09-29 WO disclosed
US-20030169574-A1 IC card and method of operating the same FUJITSU LIMITED (JP) 2003-09-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060057426-A1 Thiophene derivative and organic electroluminescent element ELL, SLC39A14, ELP1 TSHR 1714/4885SMN1; SMN2 4106/4885CYP2D6 2442/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.